Surface Coating on Aluminum Flakes with Titanium Nitride Layer by Barrel-Sputtering Techniques

Akamaru, Satoshi; Honda, Yuji; Taguchi, Akira; Abe, Takayuki

doi:10.2320/matertrans.mra2008014

Cited by 7 publications

(3 citation statements)

References 25 publications

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“…It indicates a decrease of compressive stress as compared to the reference sample (deposited without hydrogen). This is probably due to lowering of ion bombardment on the growing thin film [44]. In order to establish this result, the total ion current to the substrate was measured at various deposition conditions.…”

Section: Plasma Characterizationmentioning

confidence: 99%

Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

Saikia

Bhuyan

Díaz-Droguett

et al. 2016

J. Phys. D: Appl. Phys.

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The properties and performance of thin films deposited by plasma assisted processes are closely related to their manufacturing techniques and processes. The objective of the current study is to investigate the modification of plasma parameters occurring during hydrogen addition in N 2 + Ar magnetron plasma used for titanium nitride thin film deposition, and to correlate the measured properties of the deposited thin film with the bulk plasma parameters of the magnetron discharge. From the Langmuir probe measurements, it was observed that the addition of hydrogen led to a decrease of electron density from 8.6 to 6.2 × (10 14 m −3) and a corresponding increase of electron temperature from 6.30 to 6.74 eV. The optical emission spectroscopy study reveals that with addition of hydrogen, the density of argon ions decreases. The various positive ion species involving hydrogen are found to increase with increase of hydrogen partial pressure in the chamber. The thin films deposited were characterized using standard surface diagnostic tools such as xray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), xray diffraction (XRD), Raman spectroscopy (RS), scanning electron microscopy (SEM) and energy dispersive xray spectroscopy (EDS). Although it was possible to deposit thin films of titanium nitride with hydrogen addition in nitrogen added argon magnetron plasma, the quality of the thin films deteriorates with higher hydrogen partial pressures.

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Section: Plasma Characterizationmentioning

confidence: 99%

Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

Saikia

Bhuyan

Díaz-Droguett

et al. 2016

J. Phys. D: Appl. Phys.

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“…The TiN lms are coated on the samples for high wear applications, and they are regularly subject to cyclic loading during the machining process. On the other hand, the TiN lms can be prepared by several methods such as physical vapor deposi-tion (PVD) [4][5][6] and chemical vapor deposition (CVD) [7][8][9] . Among the PVD techniques, sputtering is quite suitable for the TiN growth since the deposited lms have several advantages including high lm density, high uniformity in thickness, smooth surface and good adhesion [10][11][12] .…”

Section: Introductionmentioning

confidence: 99%

Improved Mechanical Properties of Al<sub>2</sub>O<sub>3</sub> Ceramics by Sputtered TiN Coatings

Chien

Lai²,

Cheng

et al. 2017

Mater. Trans.

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In this study, TiN thin lms have been prepared as the coating layers on Al 2 O 3 ceramic substrates to enhance the mechanical properties of Al 2 O 3 ceramics. TiN lms with various thicknesses of 0.5 and 1 μm were deposited by DC sputtering at room temperature. The TiN lm prepared on the Al 2 O 3 substrate has a columnar structure without large bumps or steps formed on the lm s surface. Without the TiN coating, the average friction coef cient of the Al 2 O 3 substrate was 0.51. As 0.5-and 1-μm-thick TiN lms were coated on Al 2 O 3 substrates, the average friction coef cients of these two samples reduced to 0.36 and 0.32, respectively, revealing the tribological characteristics of Al 2 O 3 ceramic was enhanced with the TiN coating. Additionally, the 1-μm-thick TiN/Al 2 O 3 sample possesses a slightly higher attrition resistance than that of the 0.5-μm-thick TiN/Al 2 O 3 sample, and this can be also con rmed by performing the elemental mapping method on the wear-treated samples. From the adhesion performances, we observed no critical load of L C2 appeared in these two samples during the scratch test, while the critical load of L C1 values were 11 and 9 N for 0.5-μm-thick TiN/Al 2 O 3 and 1-μm-thick TiN/Al 2 O 3 , respectively. Due to the increment of TiN thickness, the internal stress formed in the lm would increase. This is the reason why the 1-μm-thick TiN/Al 2 O 3 sample has a lower critical load of L C1 . Obviously, the 0.5-μm-thick TiN lm coated on the Al 2 O 3 substrate has a better adhesion characteristic. According to these results, the sputtered TiN coating is indeed useful for improving the mechanical properties of Al 2 O 3 ceramics, in particular for the 0.5-μm-thick TiN coating. [

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“…This study aims to prepare nanoparticle-coated microaluminum flake composite powders through high-energy ball milling. Given their high optical and mechanical properties, TiN nanoparticles were chosen as the functional material in the development of new optical composite powders [15]. The morphology, structural changes, and optical property of the composite powder were then investigated.…”

Section: Introductionmentioning

confidence: 99%

Facile Synthesis and Optical Properties of TiN/Al Composite Powders with Nano/Microstructure by Ball-Milling Method

Zhang

et al. 2013

AMR

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TiN-coated aluminum pigments were prepared by nanoparticle-bonding technology of high-energy ball milling. The effect of ball milling on the morphology and evolution of the composite powders was investigated via field-emission scanning electron microscopy, transmission electron microscopy, and particle size distribution analysis. Results show that the TiN nanoparticles bonded to the surface of aluminum microflakes under the action of a mechanical force but in the absence of any binder. A uniform nanoparticle coating formed on the surface of the flake aluminum microparticle. The optical reflectance of the TiN/Al composites was measured within 200 nm to 2500 nm wavelength. The reflectance gradually decreased as the milling time was prolonged.

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Surface Coating on Aluminum Flakes with Titanium Nitride Layer by Barrel-Sputtering Techniques

Cited by 7 publications

References 25 publications

Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

Improved Mechanical Properties of Al<sub>2</sub>O<sub>3</sub> Ceramics by Sputtered TiN Coatings

Facile Synthesis and Optical Properties of TiN/Al Composite Powders with Nano/Microstructure by Ball-Milling Method

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