“…In this regard, many HF-free etching methods have been recently reported, including hydrothermal etching, , electrochemical etching, and molten salt etching. , The latter method, in particular, which may involve the use of Lewis acid–based etching, has allowed for the synthesis of MXenes terminated with other functional species (e.g., Cl and S) (Figure D). For example, transition metal halides, such as CdCl 2 , CdBr 2 , ZnCl 2 , and CuCl 2 have been studied for Lewis acid etching, leaving behind halogen terminal groups. − Besides, given that the A-element in MAX phases and the Lewis acid molten salt cation could form direct redox coupling, this method was further extended for etching other MAX phases with different A-elements apart from Al, e.g., Al, Zn, Si, and Ga. More importantly, surface functional groups such as −O, −OH, −F, −Cl, −NH 3 , or −NH 4 + , tailored by employed etching agents, can have a crucial impact on physicochemical properties as well as electrochemical behaviors such as work function. , The −OH termination can improve the chemisorption of Ti 3 C 2 T x MXene through the ion exchange process …”