Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent

Niino, Hiroyuki; Yasui, Yukinori; Ding, Ximing; Narazaki, Aiko; Sato, Tadatake; Kawaguchi, Yuji; Yabe, Akira

doi:10.1016/s1010-6030(03)00032-7

Cited by 88 publications

(54 citation statements)

References 18 publications

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“…The most popular technologies are laser-induced backside wet etching (LIBWE) [16,[19][20][21][22], laser-induced backside dry etching (LIBDE) [17,18,23], laser induced plasma assisted ablation (LIPAA) [24][25][26], and lased-induced black-body heating (LIBBH). The last one has been developed at Laser Technology Department of ITMO University [27][28][29][30][31].…”

Section: ключевые слова: Fused Silica Microstructuring Microlens Arrmentioning

confidence: 99%

Microlens array fabrication on fused silica by LIBBH technology with CO2 laser smoothing

Zakoldaev¹,

Kostyuk²,

Koval³

et al. 2016

Izv. vysš. učebn. zaved., Priborostr.

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A new technology for microlens array fabrication is presented. The technology is based on creation of the initial microstructures on fused silica by laser indirect method, and the following reflow process of these structures made by CO 2 laser action. Microlens arrays with diameter of microlens equal to 150 µm are fabricated. The focal length of microlens varies from 5 up to 5 mm. Profiles of formed microlens correspond to circle equation. Ключевые слова: fused silica microstructuring, microlens array, LIBBH, CO 2 laserIntroduction. At present different arrays of microoptical elements are traditionally used for transformation and processing of optical signals, for fiber-optical connections and integrated optical control systems [1] as well as to transform of intensity distribution in laser technology [2,3]. As the array of microoptical elements means a set of modified regions, located in a certain order on glass surface [2,4] and can be called microlens array (MLA). Such MLAs have a special arrangement and a given filling rate within the array, all these specifications depend on the problem to be solved with the final array.Not only optical-physical specific requirements are imposed on MLA in particular application, but also requirements on the surface quality in general. Particular attention is paid to the fabrication of MLAs on materials of traditional optics as silicate glass [5]. Thus, the developers' preferences are given to fused silica, which can be characterized by high light transmittance in wavelength range of 200-2500 nm and high chemical, thermal, and radiation resistance [6].Among the traditional technologies of MLAs fabrication on glass surface, the best known technologies are: photolithography [7], ion etching [8], hot embossing process [9], and so on. These technologies can be characterized not only by high quality of fabricated MLAs and high reproducibility, but also use multistage processing; manufacturing of MLAs with low numerical aperture (NA) presents difficulties when the technology is employed [7]. Currently, great attention is paid to MLAs fabrication with the usage of laser technology. It is also called as direct laser beam writing, which is based on strong absorption of CO 2 laser radiation [10], UV radiation [11] by glass , or on interaction with ultrashort laser pulses [12].Combined laser-induced technologies based on strong absorption of laser radiation by inorganic [13,14] or organic [15,16] solutions and metals [17,18] contact with the back side of the glass plate are widely spread today. The most popular technologies are laser-induced backside wet etching (LIBWE) [16,[19][20][21][22], laser-induced backside dry etching (LIBDE) [17,18,23], laser induced plasma assisted ablation (LIPAA) [24][25][26], and lased-induced black-body heating (LIBBH). The last one has been developed at Laser Technology Department of ITMO University [27][28][29][30][31]. Various arrays of microoptical elements formed on fused silica surface according to this technology include random phase plates [27], si...

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Section: ключевые слова: Fused Silica Microstructuring Microlens Arrmentioning

confidence: 99%

Microlens array fabrication on fused silica by LIBBH technology with CO2 laser smoothing

Zakoldaev¹,

Kostyuk²,

Koval³

et al. 2016

Izv. vysš. učebn. zaved., Priborostr.

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“…According to optical images monitored by time-resolved shadowgraph technique, the laser vaporization of toluene liquid showed shockwave propagation and vapour expansion at the interface between silica glass and toluene liquid 15,19,21,22,25,31,33) .…”

Section: Transient Pressure Measurement Of Toluene Vaporizationmentioning

confidence: 99%

“…150 μm shock wave and vapour bubble was observed around the interface between silica glass and liquid by shadowgraph technique 15) . The formation and propagation of shock wave and vapour bubble in pure toluene liquid were also observed upon KrF laser irradiation at the fluence of 600 mJ cm −2 15,19) .…”

Section: (A) (B)mentioning

confidence: 99%

“…Initial velocities of hemispheric expansion for the vapour bubble were 200 m s −1 at the fluence of 1.6 J cm −2 . The impact pressure of the liquid jet during the bubble expansion can be estimated to be 220 MPa from the observation of the bubble behaviour 15) . This estimate suggests that the laser irradiation of toluene liquid provided a unique environment under a transient high pressure.…”

Section: (A) (B)mentioning

confidence: 99%

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Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

Niino

Kawaguchi

Sato

et al. 2008

The Review of Laser Engineering

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We have investigated a one-step method to fabricate a microstructure on a silica glass plate by using laser-induced backside wet etching (LIBWE) that consists of excimer laser mask projection system and diode-pumped solid state (DPSS) laser beam scanning system. Well-defined deep microtrenches without crack formations on a fused silica glass plate were fabricated by LIBWE method with the UV lasers. We have demonstrated the microof pits-array and patterned grating on the surface of silica glass plates by LIBWE method at nm and 266 nm with dye solutions. The two new systems allow us to use rapid prototyping high precision surface microfabrication of silica glass as laser direct-write processing.

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“…The depth of the etch increases linearly with the number of laser shots. Typical etch rates of the material were 0.1-40 nm pulse -1 , depending on irradiation conditions such as laser wavelength, laser fluence, and dye concentrations.Micro-fabrications of various transparent materials, such as silica glass [9,[12][13][14][15][16][18][19][20][21][22][23][24][25][26][27]29,30,34,35], quartz [10,25,28,[31][32][33], glasses (Pyrex, etc.) …”

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confidence: 99%

Surface microstructures of silica glass by laser-induced backside wet etching

et al. 2008

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Surface micro-structuring of silica glass plates was performed by using laser-induced backside wet etching (LIBWE) upon irradiation with a single-mode laser beam from a diode-pumped solidstate UV laser at 266 nm. We have succeeded in a well-defined micro-pattern formation without debris and microcrack formations around the etched area on the basis of galvanometer-based point scanning system with the laser beam. The behavior of liquid ablation (explosive vaporization) was monitored by impulse pressure detection with a fast-response piezoelectric pressure gauge. LIBWE method is suitable for rapid prototyping and rapid manufacturing of surface microstructuing of silica glass as mask-less exposure system in a conventional atmospheric environment.Keywords: laser ablation, explosive vaporization of liquid, diode-pumped solid state UV laser, single mode laser beam, silica glass, surface micro-structuring IntroductionLaser-induced micro-structuring of various materials has served as an important technique in surface fabrication for optics and optoelectronic devices [1]. In particular, significant attention has been given towards the microstructuring of silica glass in spite of the difficulty involved, since silica is a commonly used material. The use of pulsed lasers can involve several approaches, such as conventional UV laser ablation [2], vacuum UV laser processing [3,4], pulsed-laser-generated x-ray [5], plasmaassisted UV ablation [6,7], and femtosecond laser micromachining [2,8]. We have demonstrated a novel one-step method, laser-induced backside wet etching (LIBWE), for micro-fabrication on a silica glass plate, involving irradiation with nanosecond-pulsed UV lasers . The LIBWE method is based on the deposition of laser energy onto a thin layer at the glass-liquid interface during the explosive vaporization (ablation) of a liquid substance. Assuming negligible UV absorption by the silica glass, the incident laser beam passes through the glass plate resulting in the excitation of the dye solution. When the dye solution close to the interface becomes ablated using laser irradiation with sufficient fluence, etching on a surface layer of the silica glass is achieved. The depth of the etch increases linearly with the number of laser shots. Typical etch rates of the material were 0.1-40 nm pulse -1 , depending on irradiation conditions such as laser wavelength, laser fluence, and dye concentrations.Micro-fabrications of various transparent materials, such as silica glass [9,[12][13][14][15][16][18][19][20][21][22][23][24][25][26][27]29,30,34,35], quartz [10,25,28,[31][32][33], glasses (Pyrex, etc.)

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Surface micro-fabrication of silica glass by excimer laser irradiation of organic solvent

Cited by 88 publications

References 18 publications

Microlens array fabrication on fused silica by LIBBH technology with CO2 laser smoothing

Microlens array fabrication on fused silica by LIBBH technology with CO2 laser smoothing

Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

Surface microstructures of silica glass by laser-induced backside wet etching

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