2016
DOI: 10.1088/1742-6596/700/1/012027
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Surface modification of tantalum pentoxide coatings deposited by magnetron sputtering and correlation with cell adhesion and proliferation inin vitrotests

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Cited by 3 publications
(3 citation statements)
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“…The changes in the structural parameters affected the surface characteristics and functional properties of the deposited coatings. As previously demonstrated and analyzed in [6], the X-ray diffraction profiles of as-deposited Ta2O5 coatings prove the amorphous nature for as-deposited magnetron sputtered Ta2O5 coatingsno peaks are observed. The Ta 4f lines of the deposited films are in a good agreement with the Ta 4f doublet representative of the Ta-O bond in Ta2O5.…”
Section: Resultssupporting
confidence: 73%
See 1 more Smart Citation
“…The changes in the structural parameters affected the surface characteristics and functional properties of the deposited coatings. As previously demonstrated and analyzed in [6], the X-ray diffraction profiles of as-deposited Ta2O5 coatings prove the amorphous nature for as-deposited magnetron sputtered Ta2O5 coatingsno peaks are observed. The Ta 4f lines of the deposited films are in a good agreement with the Ta 4f doublet representative of the Ta-O bond in Ta2O5.…”
Section: Resultssupporting
confidence: 73%
“…The volt-ampere characteristics of the magnetron discharge with tantalum target in argon for different values of the reactive gas flow were presented previously [6]. The deposition process carried out with simultaneous bombardment by argon ions resulted in structural changes of the growing films.…”
Section: Resultsmentioning
confidence: 99%
“…Films are characterized with Nanomap 1000, a non-contact optical profilometer for measuring RMS surface roughness R q , and average surface roughness R a . An optical profilometer evaluates the surface roughness with phase shift interferometry utilizing the reflected light from the sample [30][31]. Surface roughness images of a bare substrate of Fused silica are shown in Figure 10 and corresponding values are tabulated in Table VI.…”
Section: Field Emission Scanning Electron Microscopy (Fesem)mentioning
confidence: 99%