Surface Modification of the Ti6Al4V Alloy with Silicon Carbonitride Layer Deposited by PACVD Method

Abstract

Four different layers of various silicon, carbon and nitrogen contents on the Ti6Al4V alloy and (001)Si wafers have been deposited by means of Plasma Assisted Chemical Vapor Deposition (PACVD) method. The layers were obtained from reactive gas mixture containing SiH 4 , CH 4 , NH 3 and Ar. After deposition the structure and chemical composition of modified surfaces have been analyzed with use of SEM/EDS technique. Based on these results and thermodynamic calculations, the diffusion coefficients, D, for nitrogen and carbon in alloy were discussed. Scratch test shown that silicon carbonitride layers have good adhesion to metal surface. In order to determine atomic structure of obtained layers, FTIR spectra for layer-(001)Si and layer-Ti6Al4V were registered.

Simultaneous Carburization, Oxidation, and Nitridation of Titanium Surface Using Ablation by Femtosecond Laser in n‐Heptane

“…The bands below 1600 cm À1 are attributed to C ¼ C and C-O vibrations, and the signals between 1600 and 1800 cm À1 come from N ¼ N, C ¼ N, and C ¼ O functional groups. [54,55] The clear fingerprints of the N ¼ C ¼ N and C-N vibrations are the characteristic peaks at approximately 2020, 2100, and 2320 cm À1 . [54][55][56] The ATR spectra also show the characteristic signal of C-H vibration at approximately 2900 cm À1 , in agreement with the Raman spectra.…”

“…[54,55] The clear fingerprints of the N ¼ C ¼ N and C-N vibrations are the characteristic peaks at approximately 2020, 2100, and 2320 cm À1 . [54][55][56] The ATR spectra also show the characteristic signal of C-H vibration at approximately 2900 cm À1 , in agreement with the Raman spectra. A surprising result is the very small intensity of O-H and N-H bands at wavenumbers above 3000 cm À1 , although the characteristic peaks due to these bands are present in the Raman spectra (see above).…”