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Plasma Assisted Chemical Vapour Deposition (PA CVD) method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified surfaces. In this study we present the overview of the possibilities of plasma processes for the deposition of diamond-like carbon coatings doped Si and/or N atoms on the Ti Grade2, aluminum-zinc alloy and polyetherketone substrate. Depending on the type of modified substrate had improved the corrosion properties including biocompatibility of titanium surface, increase of surface hardness with deposition of good adhesion and fine-grained coatings (in the case of Al-Zn alloy) and improving of the wear resistance (in the case of PEEK substrate).Keywords: PA CVD, titanium, aluminum alloys, polyetheretherketone, ceramic coatings Metoda chemicznego otrzymywania warstw z fazy gazowej w warunkach plazmy (PA CVD -Plasma Assisted Chemical Vapour Deposition) umożliwia otrzymywanie homogenicznych struktur warstwowych w niskich temperaturach, o dobrej adhezji do podłoży. Warunki w jakich prowadzone są procesy plazmochemiczne w znacznym stopniu decydują o właściwościach fizykochemicznych modyfikowanych powierzchni. W pracy przedstawiono możliwości w zakresie projektowania procesów plazmochemicznych z otrzymaniem warstw DLC (Diamond-like Carbon) dotowanych atomami Si i/lub N. W zależności od rodzaju modyfikowanego podłoża uzyskano poprawę właściwości korozyjnych przy zachowaniu biokompatybilności powierzchni (w przypadku Ti Grade2), poprawę twardości powierzchni na drodze otrzymania drobnoziarnistej powłoki o dobrej adhezji do podłoża (w przypadku Al-Zn) i poprawę odporności na zużycie (w przypadku PEEK).

Four different layers of various silicon, carbon and nitrogen contents on the Ti6Al4V alloy and (001)Si wafers have been deposited by means of Plasma Assisted Chemical Vapor Deposition (PACVD) method. The layers were obtained from reactive gas mixture containing SiH 4 , CH 4 , NH 3 and Ar. After deposition the structure and chemical composition of modified surfaces have been analyzed with use of SEM/EDS technique. Based on these results and thermodynamic calculations, the diffusion coefficients, D, for nitrogen and carbon in alloy were discussed. Scratch test shown that silicon carbonitride layers have good adhesion to metal surface. In order to determine atomic structure of obtained layers, FTIR spectra for layer-(001)Si and layer-Ti6Al4V were registered.

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One way of obtaining new materials with different properties is to modify existing ones to improve their insufficient properties. Due to the fact that many of the useful properties of materials, including wear and corrosion resistance, friction coefficient and biocompatibility, depend on the state of the surface, modern surface engineering methods are especially helpful. They involve the deposition of the layers with tailored chemical composition and structure. In terms of medical applications, amorphous or nanocrystalline layers containing carbon, nitrogen, silicon and hydrogen appear to be the most suitable. They combine the beneficial properties of silicon carbide SiC and silicon nitride Si3N4, and thus exhibit a strong resistance to oxidation at high temperatures, high modulus of elasticity, low friction coefficient and wear resistance. However, silicon carbonitride compound is not stable thermodynamically in normal conditions and therefore it must be obtained by non-conventional synthesis. One of such method is Plasma Assisted Chemical Vapour Deposition (PACVD). The authors of this paper anticipate that the modification of titanium surface by SiCxNy(H) layers make them proper for use as materials for long-term contact with human body. It contains results of research on titanium Ti Grade 2 surface modification by deposition amorphous carbon layers doped with nitrogen (a-C:N:H) and silicon carbonitride layers SiCxNy(H). What is more, for IR analysis, in the same plasmochemical methods process obtain layers on monocrystaline silicon (001)Si. The layers were synthesis by PACVD with plasma generated by radio waves (RFCVD, 400 W, 13.56 MHz) for a-C:N:H layers and microwaves (MWCVD, 2 kW, 2.45 GHz) for layers containing silicon, carbon, nitrogen and hydrogen. During deposition process metallic surface were ion-etching by argon plasma. The layers were obtained from reactive gas mixture containing CH4, N2or NH3for a-C:N:H layers and CH4, SiH4, N2or NH3for silicon carbonitride compound. In this process argon was used as an inert gaseous. Process conditions allowing obtaining good adhesive layer to the metallic substrate were specified. Obtained systems were subject for further research. Chemical composition of the materials were studied by SEM / EDS techniques with application ETD and BSED detectors. Compared images registered for titanium before surface modification and surfaces covered by a-C:N:H or SiCxNy(H) layers. More information about layers structure provided FTIR spectroscopy. Spectra FTIR was register transmition for (001)Si-layer and reflective for titanium-layer systems. Assessed the impact of different kind of substrate on the layers deposited structure. Operational properties of synergic layer-titanium systems were evaluated in the measurements of tribological parameters. This tests shown that silicon carbonitride layers have the lowest friction coefficient and the highest resistance to wear. Furthermore, it was possible, on the basis of the obtained result, to indicate directions the surface modifications ensuring optimization on their usable properties as medicine and another industries. In previous authors paper the layers were investigated in the aspect of possible application in medicine.