2004
DOI: 10.1016/j.jcrysgro.2003.11.079
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Surface morphology of heavily carbon-doped GaAs grown by solid source molecular beam epitaxy

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Cited by 3 publications
(2 citation statements)
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“…1 with different growth temperatures. The root-meansquare (RMS) surface roughness decreases from 2.32 to 0.26 nm (RMSo0:50 nm is typical for two-dimensional (2D) growth [16,17]) with increasing growth temperature from 360 (A1) to 410 C (A4) as shown in Fig. 2.…”
Section: Surface Morphologymentioning
confidence: 94%
“…1 with different growth temperatures. The root-meansquare (RMS) surface roughness decreases from 2.32 to 0.26 nm (RMSo0:50 nm is typical for two-dimensional (2D) growth [16,17]) with increasing growth temperature from 360 (A1) to 410 C (A4) as shown in Fig. 2.…”
Section: Surface Morphologymentioning
confidence: 94%
“…The high C-doping of GaAs is known to produce surface roughening due to the presence of carbon defects that alter the growth front evolution in MBE [Tan04] and MOVPE [Li97][Li97b], for intrinsically-doped or halide-doped samples. In particular, the methyl groups adsorbed on the growth surface are suggested responsible for the change of growth mode by generating step pinning, defects and island growth, which ultimately produce a progressive surface roughening.…”
Section: Influence Of the Heavy Cbr 4 -Doping On The Gaas Materials S...mentioning
confidence: 99%