surface states of topological insulators are protected by time reversal symmetry, which makes them impervious to nonmagnetic perturbations and restricts scattering. [1,3,4] For these reasons, topological insulators have garnered great interest. [1,2] Topological crystalline insulators (TCIs) are a subset of topological materials that are narrow band gap semiconductors in the bulk with gapless surface states; however, the topological surface states are protected by lattice symmetry rather than time reversal symmetry. [2,[5][6][7][8][9][10][11][12][13][14][15][16] Topological crystalline insulators have been theoretically predicted and experimentally realized on compounds with orbital degrees of freedom playing a similar role to spin in topological insulators; [2,[5][6][7][8][9][10][11][12][13][14][15][16] one such material is SnTe. [5][6][7][8][9][10][11][12][13][14][15][16] The key role played by surface symmetry in protecting the topological states suggests that the TCI properties can be manipulated by introducing symmetry breaking surface features. As a first step toward this goal, we have studied the epitaxial growth of SnTe films and characterized their structural and electronic properties. It will be shown that the growth process and subsequent postgrowth treatment creates characteristic defects that can alter the local electronic properties of the surface down to the atomic scale.Topological crystalline insulators (TCIs) are new materials with metallic surface states protected by crystal symmetry. The properties of molecular beam epitaxy grown SnTe TCI on SrTiO 3 (001) are investigated using scanning tunneling microscopy (STM), noncontact atomic force microscopy, low-energy and reflection high-energy electron diffraction, X-ray diffraction, Auger electron spectroscopy, and density functional theory. Initially, SnTe (111) and (001) surfaces are observed; however, the (001) surface dominates with increasing film thickness. The films grow island-by-island with the [011] direction of SnTe (001) islands rotated up to 7.5° from SrTiO 3 [010]. Microscopy reveals that this growth mechanism induces defects on different length scales and dimensions that affect the electronic properties, including point defects (0D); step edges (1D); grain boundaries between islands rotated up to several degrees; edge-dislocation arrays (2D out-of-plane) that serve as periodic nucleation sites for pit growth (2D in-plane); and screw dislocations (3D). These features cause variations in the surface electronic structure that appear in STM images as standing wave patterns and a nonuniform background superimposed on atomic features. The results indicate that both the growth process and the scanning probe tip can be used to induce symmetry breaking defects that may disrupt the topological states in a controlled way.