Surface Plasmon Characterization of Positive-Tone Photoimaging in Polymer Langmuir−Blodgett Films

Mitsuishi, Masaya; Li, and Tiesheng; Miyashita, Tokujı

doi:10.1021/la020420x

Cited by 6 publications

(5 citation statements)

References 22 publications

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“…8(a), the absorption bands of the p(nPMA-AMMA) LB films decreased and disappeared as deep UV In the IR spectra (Fig. 9), a significant absorbance at about 3400 cm 21 , assigned to an -OH stretching vibration, increased after irradiation at 254 nm (1.56 mW cm 22 ). The anthrylmethyl ester is decomposed by deep UV irradiation; then, the carboxylic group is formed through H-abstraction.…”

Section: Photopatterning Mechanism Of P(npma-amma) Lb Filmsmentioning

confidence: 98%

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Photolithographic properties of ultrathin polymer Langmuir–Blodgett films containing anthracene moieties

Chen

Mitsuishi

et al. 2003

J. Mater. Chem.

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This study investigated the unique photolithographic properties of poly(N-neopentyl methacrylamide-co-9anthrylmethyl methacrylate) (p(nPMA-AMMA)) ultrathin films prepared by the Langmuir-Blodgett (LB) technique. The copolymer forms a stable monolayer on a water surface and LB films with any desired number of layers. The nPMA group in the LB film acts as a photodecomposition group under irradiation at 254 nm. On the other hand, photodimerization occurred between anthracene groups under irradiation at 365 nm. Consequently, positive-tone and negative-tone patterns were printed on a silicon wafer by choosing a suitable irradiation light wavelength. Etching resistance of p(nPMA-AMMA) LB films was also investigated in a nanometer regime permitting etching of gold or copper films.

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Section: Photopatterning Mechanism Of P(npma-amma) Lb Filmsmentioning

confidence: 98%

“…The anthrylmethyl ester is decomposed by deep UV irradiation; then, the carboxylic group is formed through H-abstraction. [21][22][23][24][25] This is the reason why the irradiated portion was developed with alkaline aqueous solution.…”

Section: Photopatterning Mechanism Of P(npma-amma) Lb Filmsmentioning

confidence: 99%

Photolithographic properties of ultrathin polymer Langmuir–Blodgett films containing anthracene moieties

Chen

Mitsuishi

et al. 2003

J. Mater. Chem.

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“…16,17 We have continued to investigate photolithographic materials with a series of polymer LB films containing N-alkylacrylamine. [18][19][20] For anthracene containing copolymer, we reported the photolithographic properties of poly (N-neopentyl methacrylamine-co-9-anthrylmethyl methacrylamine) LB films, found this ultrathin films could undergo not only photodimerization under irradiation at 365 nm, resulting a fine negative-tone pattern, but photodecomposition at 254 nm, resulting fine positive-tone pattern. It means that both the positive-tone and negative-tone photoresist patterns can be obtained by choosing a suitable irradiation wavelength.…”

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confidence: 99%

Controllable photopatterning and photochemical properties of novel copolymer containing dianthracene langmuir–blodgett films

Tang

et al. 2011

J Polym Sci B Polym Phys

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A new series of copolymer poly(N-hexadecylmeth acrylamide-co-bis(anthracen-9-ylmethyl) 2-allylmalonate) [poly(HDMA-co-DAnMAMA)]s containing swallow-tailed double anthracenyl groups and long alkyl group are designed and synthesized. The main route of the photochemical reaction of the p(HDMA-DAnMAMA)copolymer Langmuir-Blodgett (LB) films is dimerization reaction between the anthracenyl groups under the irradiation of both 365 and 248 nm for limiting irradiation time, resulting to a fine negative-tone pattern. On the other hand, the anthracenyl groups act just as photodecomposition group under 248 nm for longer irradiation time, resulting to a fine positive-tone pattern. Consequently, positive-tone and negative-tone pattern are obtained by choosing not only a suit-Additional Supporting Information may be found in the online version of this article.

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“…In fact, preparation of pDDA monolayers requires no addition of ions to the water subphase to stabilize the monolayer formation. The pDDA monolayers were deposited onto numerous substrates, such as quartz, glass, ITO glass, 10,11 metals, 18,19 plastic fiber, and spin-coated films.…”

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confidence: 99%

Hybrid Polymer Nanoassemblies: Polymer Nanosheets Organized with Metal Nanoparticle Arrays for Surface Plasmon Photonics

Mitsuishi

Ishifuji

Endô

et al. 2007

Polym J

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ABSTRACT:The paper describes fabrication of hybrid polymer nanoassemblies possessing polymer nanosheets and metal nanoparticle arrays. Based on a bottom-up approach with ultrathin polymer Langmuir-Blodgett films (polymer nanosheets) and metal nanoparticles, we constructed hybrid nanoassemblies for opto/electric nanodevice applications: nanoscale positioning of metal nanoparticles, free-standing hybrid polymer nanosheets, hybrid polymer nanoassemblies for luminescence sensor application, and enhancement of nonlinear optical (NLO) efficiency via surface plasmon coupling. Assembling nanomaterials such as nanoparticles and organic functional molecules through a bottom-up approach makes it possible to strengthen free-standing nanofilm stability, enhance luminescence of luminescent molecules, and enhance second harmonic light from NLO molecules under the influence of localized surface plasmons. The high potential of hybrid polymer nanoassemblies for precise nanoscale design is also demonstrated.[doi:10.1295/polymj.PJ2006235] KEY WORDS Polymer / LB Film / Metal Nanoparticle / Surface Plasmon / Hybrid / Design of nanostructures using polymer materials has been widely explored and has now become prevalent. Bottom-up approaches such as layer-by-layer (LbL) adsorption, 1 surface-initiated polymerization exemplified by atom transfer radical polymerization (ATRP), 2 and Langmuir-Blodgett (LB) technique [3][4][5][6][7] make it possible to develop myriad nanoarchitectures on solid substrates. These approaches and their combinations offer a promising route to polymer nanoarchitectures for a wide variety of functional materials and surfaces. Using these nanostructures, for instance, the surface properties can be controlled uniformly, even on a nanoscale. These compelling qualities of ultrathin polymer films have been expanded to broad scientific fields. It is important to intensify the interdisciplinary interactions, for example, between polymer materials and inorganic nanoparticles in basic and application-oriented work.We have investigated functionalization of polymer LB films consisting of poly(alkylacrylamide)s. Poly-(N-dodecylacrylamide) (pDDA) proved to be excellent for LB assembly; the material provides a highly oriented and densely packed monolayer at the airwater interface. 8,9 Varying the side chain length, the film thickness is tuned at a nanometer scale (1-2 nm in length). Widely various functional molecules were incorporated and distributed uniformly in a two-dimensional (2D) field. The key factor is the existence of a 2D hydrogen-bonding network between polymer backbones, which enhances the monolayer stability at the air-water interface, leading to quantitative deposition onto solid substrates via vertical dipping. We recently designated polymer LB films consisting of alkyl acrylamide polymer as polymer nanosheets. Using these advantages, directional (vectorial) electron transfer between several redox components was achieved in multilayered polymer nanosheets, 10,11 extending to logic gate operations.12, 13 We have...

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Surface Plasmon Characterization of Positive-Tone Photoimaging in Polymer Langmuir−Blodgett Films

Cited by 6 publications

References 22 publications

Photolithographic properties of ultrathin polymer Langmuir–Blodgett films containing anthracene moieties

Photolithographic properties of ultrathin polymer Langmuir–Blodgett films containing anthracene moieties

Controllable photopatterning and photochemical properties of novel copolymer containing dianthracene langmuir–blodgett films

Hybrid Polymer Nanoassemblies: Polymer Nanosheets Organized with Metal Nanoparticle Arrays for Surface Plasmon Photonics

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