Surface Properties of Electrochemically Buffed Titanium Casting

Okawa, Shinpei; Hossain, Awlad; Kanatani, Mitsugu; Watanabe, Kouichi; Miyakawa, Osamu

doi:10.4012/dmj.23.504

Cited by 10 publications

(8 citation statements)

References 19 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Similarly, titanium is not easy to mirror-finish, as it has been so reported in previous studies [22][23][24][25][26] .…”

Section: Introductionmentioning

confidence: 78%

“…To account for the difference, individual contributions of solute oxygen and oxide-constituent oxygen to O Kα spectrum were assessed as follows: Oxygen amount per unit area in a layer is represented by dBW/100, (1) where d is thickness of layer, B is density, and W is oxygen concentration expressed as weight percentage. The oxygen amount in 4-nm thick oxide film was calculated as 0.79 μg/cm 2 , assuming that the film comprised TiO 2 (B＝4.93 g/cm 3 In electromechanical buffing, titanium becomes gold-colored when voltage higher than 5 V is applied 26) .…”

Section: Discussionmentioning

confidence: 99%

See 1 more Smart Citation

Abrading Increases Oxygen and Hardness of Titanium Surface

2006

Self Cite

View full text Add to dashboard Cite

CP Ti was mirror-polished and then abraded with waterproof SiC papers of two different grit sizes: 16 and 3μm. Aspolished and abraded surfaces were characterized by means of EPMA, XPS, XRD, and hardness test.Oxygen in the mirror-polished surface was uniformly distributed at the lowest level. Comparatively, abrading with SiC papers increased the surface oxygen amount and hardness.Owing to its excellent abrasivity, the coarse grit efficiently scratched the surface and hindered the regenerated oxide film from growing thick, but allowed only the metal-oxide interfacial gradient zone to extend. But, the fine grit merely rubbed the surface and allowed both the oxide film and interfacial zone to extend. Further, the surface appeared to be lightly yellow-colored, suggesting that the oxide film was thicker, probably within 10 nm, than the nominal one.When compared with the bulk, the interfacial zone was rich in oxygen and therefore subjected to high coherency strain, which was introduced to relieve the great lattice mismatch between the outer and inner layers of titanium substrate. Effects of solute oxygen hardening and strain hardening were speculated to be responsible for the surface hardening of both SiCabraded surfaces. In conclusion, abrading with a coarse grit led to accumulation of a high, non-uniform strain in the titanium substrate, thereby hardening the surface further.

show abstract

“…Similarly, titanium is not easy to mirror-finish, as it has been so reported in previous studies [22][23][24][25][26] .…”

Section: Introductionmentioning

confidence: 78%

Section: Discussionmentioning

confidence: 99%

Abrading Increases Oxygen and Hardness of Titanium Surface

2006

Self Cite

View full text Add to dashboard Cite

show abstract

“…When this method was applied to Ti polishing, no elements responsible for causing contamination were detected by electron probe microanalysis (EPMA) 10) . In light of the result obtained 10) , this method showed itself to be an effective surface treatment for Ti to render it to be more biocompatible. However, the polished Ti surface was colored golden due to a thick oxide film formed by anodic oxidation.…”

Section: Introductionmentioning

confidence: 99%

“…For this reason, it is necessary to produce a clean Ti surface without reactive and contaminated layers. We have proposed an electrochemical polishing method to prepare clean Ti surfaces 10) . When this method was applied to Ti polishing, no elements responsible for causing contamination were detected by electron probe microanalysis (EPMA) 10) .…”

Section: Introductionmentioning

confidence: 99%

“…We have proposed an electrochemical polishing method to prepare clean Ti surfaces 10) . When this method was applied to Ti polishing, no elements responsible for causing contamination were detected by electron probe microanalysis (EPMA) 10) . In light of the result obtained 10) , this method showed itself to be an effective surface treatment for Ti to render it to be more biocompatible.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Chemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide-mirror polishing and surface properties

Okawa

Watanabe

2009

Dent. Mater. J.

Self Cite

View full text Add to dashboard Cite

Chemical mechanical polishing (CMP) of cpTi (Ti) was carried out using two types of slurries, acidic and basic colloidal silica containing H2O2 up to 3 wt％, to obtain flat and mirror-polished surfaces without any contaminated and reacted layers. Polishing behavior and surface properties were investigated using AFM, EPMA, and XPS. Weight loss of Ti polished by CMP using the basic slurry was larger than that using the acidic one, and surface roughness was less than 2 nm RMS when basic slurry containing 3 wt％ H2O2 was used. Moreover, three kinds of chemical species, OH -, O 2-, and H2O, were detected on the Ti surfaces polished by CMP using these slurries. Results of this study showed that CMP using colloidal silica containing H2O2 successfully created a mirror-polished surface without contaminated and reacted layers.

show abstract