Surface Property of Plasma Deposited Copolymer Films Using Chlorofluorocarbon with Ethylene Monomer

Abstract

We report a study of plasma polymerized copolymer films using an r.f. plasma (13.56MHz), were deposited CFC-113 with C2 hydrocarbon monomer such as ethane (C2H6), ethylene (C2H4) and acetylene (C2H2) monomers at a different mole ratios. We established an effect of the mixing ratio of CFCs with C2 hydrocarbon monomers, the film properties were measured as a function of mole ratio [CFCs : C2H4] as well as refractive index (1.3 1.45), density (1.6'-2.O glcm3) respectively obtained. The contact angle of the water for copolymer were obtained 97° ' 104° when the mole ratio of 1:1 (CFCs : C2H4), also due to increases the CFCs concentration, the adhesion strength of the copolymer on glass was 50% increased. The adhesion strength is much corresponding with hydrocarbon and fluorine concentration on the polymer surfaces at various mole ratios of chlorofluorocarbon and C2H4 monomer. We also obtained deposition profiles of copolymer film shows good step coverage (80%) on metallic underlayer materials.

Fluoropolymer Film Formation by Electron Activated Vacuum Deposition

“…PCTFE is a FP with one chlorine atom per unit of macromolecule. Its films were produced by plasma polymerization [24][25][26], electron [18] and laser [27] beam ablation, by thermal evaporation as well [1,7]. The smoothness and optical properties of the fluoropolymer films, deposited by EVD seems high enough for their applications in optoelectronics [1,7,28].…”