2016
DOI: 10.1002/adfm.201600654
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Surface‐Shielding Nanostructures Derived from Self‐Assembled Block Copolymers Enable Reliable Plasma Doping for Few‐Layer Transition Metal Dichalcogenides

Abstract: Precise modulation of electrical and optical properties of 2D transition metal dichalcogenides (TMDs) is required for their application to high‐performance devices. Although conventional plasma‐based doping methods have provided excellent controllability and reproducibility for bulk or relatively thick TMDs, the application of plasma doping for ultrathin few‐layer TMDs has been hindered by serious degradation of their properties. Herein, a reliable and universal doping route is reported for few‐layer TMDs by e… Show more

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Cited by 21 publications
(34 citation statements)
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“…The cubic shape is almost unaffected after plasma treatment (Figure S12, Supporting Information). LT plasma has intrinsic surface selectivity owing to the low thermal effect, which enables its wide application as a surface modification technique . It is possible that the external surface of the Co‐PBA nanocrystals is more significantly affected by the plasma.…”
Section: Resultsmentioning
confidence: 99%
“…The cubic shape is almost unaffected after plasma treatment (Figure S12, Supporting Information). LT plasma has intrinsic surface selectivity owing to the low thermal effect, which enables its wide application as a surface modification technique . It is possible that the external surface of the Co‐PBA nanocrystals is more significantly affected by the plasma.…”
Section: Resultsmentioning
confidence: 99%
“…Poly(methyl methacrylate) (PMMA) is first spin‐coated over the entire substrate to act as a sacrificial layer for lift‐off in the final stages to remove any residual BCP. Next the substrate is coated with a polystyrene‐ block ‐polydimethylsiloxane (PS‐ b ‐PDMS) layer which self‐assembles into periodic arrays of PDMS spheres embedded in a PS matrix through a toluene vapor annealing process, as previously reported . PS‐ b ‐PDMS is chosen for the fabrication of a self‐organized nanotemplate because of its desirable etch selectivity, the formation of highly ordered features, and its scalability to small dimensions due to its high Flory–Huggins interaction parameter (χ) .…”
Section: Resultsmentioning
confidence: 99%
“…Plasma etching is the most common method in the microelectronic industry, in combination with etching masks, such as photoresist materials, soft lithography, and laser-based technique [ 45 , 47 , 48 ]. The etching process increases the roughness of the surface, induces the nanostructure, and therefore increases the surface-to-volume ratio and changes the surface energy.…”
Section: Surface Nanostructuring By Plasmamentioning
confidence: 99%