1977
DOI: 10.1002/pssa.2210420208
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Surface states in GaAs tunnel MIS structures

Abstract: Thin Al2O3 films are grown on GaAs by low temperature reaction between O2 and Al molecular beams. A high quality of the films is confirmed from the analysis of tunneling current and capacitance—voltage (C—U) characteristics of Si/Al2O3(≈100 Å)/Al structures. High frequency C—U characteristics of p‐GaAs(100)/Al2O3(≈100 Å)/Al structures are in agreement with theoretical predictions. V‐shape surface state density distributions and midgap state density of 2 × 1012/cm2eV at the GaAs/Al2O3 interface are obtained fro… Show more

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Cited by 16 publications
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