This paper deals with theoretical approach to surface tension of molten silicon and germanium, and contributes to this field, which is very important. A theoretical calculation for determining the surface tension of high-temperature semiconductor melts, such as molten silicon and germanium, in the temperature range 1687-1825 K and 1211-1400 K, respectively, is described. The calculated temperature-dependence surface tension data for both Si and Ge are expressed as γ = 876 − 0.32 (T − T m ) and γ = 571 − 0.074 (T − T m ) (mJ m −2 ), respectively. These values are in consistence with the reported experimental data (720-875 for Si and 560-632 mJ m −2 for Ge). The calculated surface tension for both elements decreases linearly with temperature.