Symmetric Tetraalkynyldisilanes

Ackerhans, Carsten; Roesky, Herbert W.; Vidović, Denis; Magull, Jörg

doi:10.1002/ejic.200390010

“…umzusetzen. [128,129] Da DippN(SiMe 3 )Ge(NH 2 ) 3 bisher nicht dargestellt und nur das über eine NH-Gruppe verbrückte (DippN(SiMe 3 )Ge(NH 2 ) 2 ) 2 NH literaturbekannt ist, [127] und ein…”

Section: Versuche Zur Hydrolyse Von Monoorganylgermaniumtrihalogenidenunclassified

“…nicht aussagekräftig. [129] Ursache hierfür ist die Bildung von Metallnitriden oder -carbiden. nach der Methode Vollmatrix Least-Squares an F² (SHELXS-97 [140] , SHELXL-97 [141] ).…”

Section: Elementaranalysen Wurden Im Analytischen Labor Des Instituts...unclassified

Darstellung neuer Organometallhalogenide mit Elementen der 13. und 14. Gruppe des Periodensystems und Versuche zur Synthese von Organogermanolen

Hohmeister¹

0

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Oligosilanes as Silyl Radical Precursors through Oxidative Si−Si Bond Cleavage Using Redox Catalysis

Yu

¹

,

Lübbesmeyer

²

,

Studer

³

2020

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Oligosilanes are of great interest in the fields of organic photonics and electronics. In this communication, a highly efficient visible‐light‐mediated hydrosilylation of electron‐deficient alkenes through cleavage of a trimethylsilyl‐polysilanyl Si−Si bond is explored. These reactions smoothly occur on readily available organo(tristrimethylsilyl)silanes and other oligosilanes in the presence of an IrIII‐based photo‐redox catalyst under visible light irradiation. Silyl radicals are generated through single electron oxidation of the oligosilane assisted by the solvent. The introduced method exhibits broad substrate scope and high functional group tolerance with respect to the organo(tristrimethylsilyl)silane and alkene components, enabling the construction of functionalized trisilanes. In addition, this catalytic system can be also applied to highly strained bicyclo[1.1.0]butanes as silyl radical acceptors.

show abstract

Oligosilanes as Silyl Radical Precursors through Oxidative Si−Si Bond Cleavage Using Redox Catalysis

Yu

¹

,

Lübbesmeyer

²

,

Studer

³

2020

View full text Add to dashboard Cite

Oligosilanes are of great interest in the fields of organic photonics and electronics. In this communication, a highly efficient visible‐light‐mediated hydrosilylation of electron‐deficient alkenes through cleavage of a trimethylsilyl‐polysilanyl Si−Si bond is explored. These reactions smoothly occur on readily available organo(tristrimethylsilyl)silanes and other oligosilanes in the presence of an IrIII‐based photo‐redox catalyst under visible light irradiation. Silyl radicals are generated through single electron oxidation of the oligosilane assisted by the solvent. The introduced method exhibits broad substrate scope and high functional group tolerance with respect to the organo(tristrimethylsilyl)silane and alkene components, enabling the construction of functionalized trisilanes. In addition, this catalytic system can be also applied to highly strained bicyclo[1.1.0]butanes as silyl radical acceptors.

show abstract

Symmetric Tetraalkynyldisilanes

Cited by 7 publications

References 14 publications

Darstellung neuer Organometallhalogenide mit Elementen der 13. und 14. Gruppe des Periodensystems und Versuche zur Synthese von Organogermanolen

Darstellung neuer Organometallhalogenide mit Elementen der 13. und 14. Gruppe des Periodensystems und Versuche zur Synthese von Organogermanolen

Oligosilanes as Silyl Radical Precursors through Oxidative Si−Si Bond Cleavage Using Redox Catalysis

Oligosilanes as Silyl Radical Precursors through Oxidative Si−Si Bond Cleavage Using Redox Catalysis

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