2018
DOI: 10.1049/iet-cds.2018.0005
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Symptom reliability: S‐parameters evaluation of power laterally diffused‐metal–oxide–semiconductor field‐effect transistor after pulsed‐RF life tests for a radar application

Abstract: This paper treats the s-parameter performance degradation by hot electron induced for N-MOSFET devices used in radar applications. This study is relevant for devices operating in the RF frequency regime. The power LD-MOSFET device (0.8 µm channel length, Gate oxide thickness 0.065 µm and 2.2 GHz) are designed and fabricated. Subsequently, life tests in pulsed RF cause, after ageing, the electrical behaviour and its relation with charge trapping at the interface are presented and discussed. Unlike all other cur… Show more

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Cited by 8 publications
(12 citation statements)
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“…8) and a high electrons concentration at the SiO 2 /LDD interface ( Fig. 9) contributed to the appearance of hot carriers [5,19]. The simulation results tend to prove that for these tests conditions (polarization, temperature, etc.)…”
Section: Results Analysis and Discussionmentioning
confidence: 56%
See 4 more Smart Citations
“…8) and a high electrons concentration at the SiO 2 /LDD interface ( Fig. 9) contributed to the appearance of hot carriers [5,19]. The simulation results tend to prove that for these tests conditions (polarization, temperature, etc.)…”
Section: Results Analysis and Discussionmentioning
confidence: 56%
“…The reliability bench diagram has been implemented is shows in Fig. 1, which will achieve the objective, namely the estimation of the lifetime of the transistors under operational radar conditions [5]. It contains eight "branches" of tests.…”
Section: Reliability Rf Pulsed Life Test Benchmentioning
confidence: 99%
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