1997
DOI: 10.1016/s0168-583x(97)00468-0
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Synchrotron radiation photoemission study of S-passivated GaAs surfaces

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“…A number of sulfur-based processes, including aqueous and gas-phase treatments, have been investigated to enhance the resistance of GaAs to oxidation. Wet chemical treatments including ammonium sulfide ((NH 4 ) 2 S), sodium sulfide (Na 2 S·9H 2 O), thionyl chloride (SO 2 Cl 2 ), thioacetamide (CH 3 CSNH 2 ), and organothiols have all been shown to generate passivating layers on GaAs surfaces with varying degrees of success. Among these compounds, (NH 4 ) 2 S has been shown to be the most effective; however, even samples treated by this method have shown degradation upon exposure to the atmosphere.…”
Section: Introductionmentioning
confidence: 99%
“…A number of sulfur-based processes, including aqueous and gas-phase treatments, have been investigated to enhance the resistance of GaAs to oxidation. Wet chemical treatments including ammonium sulfide ((NH 4 ) 2 S), sodium sulfide (Na 2 S·9H 2 O), thionyl chloride (SO 2 Cl 2 ), thioacetamide (CH 3 CSNH 2 ), and organothiols have all been shown to generate passivating layers on GaAs surfaces with varying degrees of success. Among these compounds, (NH 4 ) 2 S has been shown to be the most effective; however, even samples treated by this method have shown degradation upon exposure to the atmosphere.…”
Section: Introductionmentioning
confidence: 99%