In situ photodeposition
presents a powerful approach
for integrating noble metal co-catalysts onto semiconductor surfaces.
However, achieving precise control over the microstructure of the
deposited co-catalyst remains a major challenge. Au nanoparticles
(NPs) are deposited onto H–KCNO using HAuCl4 in
the presence of various sacrificial agents in this study. Notably,
the choice of sacrificial agent decisively influences the exposed
crystal facets, loaded content, and particle size of the deposited
Au NPs. Importantly, in situ photodeposition under
an ethanol solution facilitates the exposure of the highly active
(111) and (220) crystal facets of Au. The introduction of Au NPs significantly
enhances photocatalytic hydrogen evolution, achieving rates of 4.93,
57.88, and 15.44 μmol/h for H–KCNO/Au–(water,
ethanol, and lactic acid), respectively. The observed photocatalytic
activity for hydrogen evolution indicates that the exposure of the
highly active planes emerges as critical for significant performance
enhancement. Photoelectrochemical and photoluminescence measurements
suggest that the highly active (111) and (220) crystal facets effectively
segregate sites for redox reactions, thereby impeding the recombination
of photogenerated electron–hole pairs.