Synthesis and characterization of silicon nanowires using tin catalyst for solar cells application

Jeon, Minsung; Kamisako, K.

doi:10.1016/j.matlet.2009.01.001

Cited by 63 publications

(32 citation statements)

References 17 publications

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“…In the second stage, the Sn nanoparticles were then used as the metal catalyst for the growth of large quantities of size controlled SiNWs can be manufactured. In comparison, this route is different to that taken in the hydrogen treatment of Au nanoparticles to produce Au-catalyzed SiNWs [18]. In addition to the one-dimensional SiNWs discussed here, Hochbaum et al has shown that the roughen nature of the SiNWs could allow other interesting properties to be investigated [23].…”

Section: Resultsmentioning

confidence: 87%

“…However, metals such as tin (Sn) [18], nickel (Ni) [19] and iron (Fe) [20] have also displayed similar catalytic effects. To date, several techniques have been used to produce SiNWs.…”

Section: Introductionmentioning

confidence: 99%

“…This is because the eutectic temperature of the Au-Si alloy is relatively low (363°C) [25]. The advantage of using an Sn-Si alloy comes firstly from its lower eutectic temperature of 232°C [18] and secondly, from the lower contamination rate during the manufacture of the SiNWs [24].…”

Section: Introductionmentioning

confidence: 99%

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Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

Poinern

Fawcett

2010

Journal of Colloid and Interface Science

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This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain. AbstractThe reverse micelle method was used for the reduction of a tin (Sn) salt solution to produce metallic Sn nanoparticles ranging from 85 nm to 140 nm in diameter. The reverse micellar system used in this process was hexane-butanol-cetyl trimethylammonium bromide (CTAB). The diameters of the Sn nanoparticles were proportional to the concentration of the aqueous Sn salt solution. Thus, the size of the Sn nanoparticles can easily be controlled, enabling a simple, reproducible mechanism for the growth of silicon nanowires, (SiNWs) using plasma-enhanced chemical vapour deposition (PECVD). Both the Sn nanoparticles and silicon nanowires were characterised using field-emission scanning electron microscopy (FE-SEM). Further characterisations of the SiNW's were made using transmission electron microscopy (TEM), atomic force microscopy, (AFM) and Raman spectroscopy. In addition, dynamic light scattering (DLS) was used to investigate particle size distributions. This procedure demonstrates an economical route for 2 manufacturing reproducible silicon nanowires using fine-tuned Sn nanoparticles for possible solar cell applications.

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Section: Resultsmentioning

confidence: 87%

“…However, metals such as tin (Sn) [18], nickel (Ni) [19] and iron (Fe) [20] have also displayed similar catalytic effects. To date, several techniques have been used to produce SiNWs.…”

Section: Introductionmentioning

confidence: 99%

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Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

Poinern

Fawcett

2010

Journal of Colloid and Interface Science

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“…The findings show that SiNWs produced using a relatively thin layer (30 nm thick) of Sn catalyst are better arranged and controlled than those produced on relatively thick Sn-coated catalysts (100 nm thick) [24]. Jeon and Kamisako used a 7 nm thick Sn catalyst at 400 °C to grow SiNWs by VLS and also obtained a homogenous diameter [25].…”

Section: Results and Discussion Morphologymentioning

confidence: 97%

Controlling the diameter of silicon nanowires grown using a tin catalyst

Al-Taay

Mahdi

Parlevliet

et al. 2013

Materials Science in Semiconductor Processing

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Silicon nanowires were grown on ITO-coated glass substrates via a pulsed plasma enhanced chemical vapor deposition method, using tin as a catalyst. The thin films of catalyst, with different thicknesses in the range 10-100 nm, were deposited on the substrates by a thermal evaporation method. The effect of the thickness of the thin film catalyst on the morphology of the silicon nanowires was investigated.The scanning/transmission electron microscopy images showed that the wire diameter increased as the thickness of the thin film catalyst increased. The nanowires grown using a thin film thickness of 10 nm were inhomogeneous in diameter, whereas the other thicknesses led to an increase in the homogeneity of the diameters of the nanowires. The dominant wire diameter of the grown silicon nanowires ranged from 70 to 80 nm with 10 nm catalyst thin film thickness, and increased to a range of 190-200 nm with 100 nm catalyst thin film thickness.

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“…16 Sn has been used to seed Si nanowires by CVD-VLS growth. 3,[24][25][26][27][28] For solution-based Si nanowire growth, colloidal Sn nanoparticles typically require relatively high molecular weight polymeric capping ligands, 29 which is not ideal for nanowire synthesis. Recently, we demonstrated SFLS growth of crystalline Si nanowires from trisilane (Si 3 H 8 ) seeded by the addition of the Sn reactant, bis(bis(trimethylsilyl)amino)tin (Sn(HMDS) 2 ), instead of pre-synthesized Sn nanoparticles.…”

Section: Introductionmentioning

confidence: 99%

Precision synthesis of silicon nanowires with crystalline core and amorphous shell

Bogart

Korgel

2013

Dalton Trans.

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A synthetic route to crystalline silicon (Si) nanowires with an amorphous Si shell is reported. Trisilane (Si 3 H 8 ) and Sn(HMDS) 2 are decomposed in supercritical toluene at 450°C. Sn(HMDS) 2 creates Sn nanoparticles that seed Si nanowire growth by the supercritical fluid-liquid-solid (SFLS) mechanism. The Si : Sn ratio in the reaction determines the growth of amorphous Si shell. No amorphous shell forms at relatively low Si : Sn ratios of 20 : 1, whereas higher Si : Sn ratio of 40 : 1 leads to significant amorphous shell. We propose that hydrogen evolved from trisilane decomposition etches away the Sn seed particles as nanowires grow, which promotes the amorphous Si shell deposition when the higher Si : Sn ratios are used.

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Synthesis and characterization of silicon nanowires using tin catalyst for solar cells application

Cited by 63 publications

References 17 publications

Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

Controlling the diameter of silicon nanowires grown using a tin catalyst

Precision synthesis of silicon nanowires with crystalline core and amorphous shell

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