2004
DOI: 10.1002/pssc.200304422
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Synthesis and characterization of SmNiO 3 thin films

Abstract: Thin films of SmNiO 3 were grown on LaAlO 3 (012) substrates using the injection-MOCVD process, a method which has been in the past successfully applied to the growth of high-quality epitaxial oxide thin films. Our investigation of as-deposited films by X-ray diffraction allows concluding on the presence of a pure SmNiO 3 phase with an epitaxial growth on the LaAlO 3 substrate. It is interesting to note, that the growth of SmNiO 3 films on LaAlO 3 (012) leads to a non-negligible in-plane compressive stress nea… Show more

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Cited by 21 publications
(21 citation statements)
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“…Bragg reflections h0h of the thin films are clearly seen nearby 00l reflections of the substrate. Furthermore, the sharpness of the diffraction peaks of the NMO thin film with 200nm in thickness film and the fact that the h0h Bragg reflection almost coincide with 00l Bragg peaks of STO (c STO =0.3905 nm) indicates that this film is epitaxially grown on the substrate with similar orientation relationship that given or studied in the previous works [12,13]. This means that the NMO thin film with 200nm in thickness grown on the STO substrate presents a fairly good crystallinity and a strong in-plane texture with the [101]-axis perpendicular to the surface of the substrate.…”
Section: Resultssupporting
confidence: 63%
“…Bragg reflections h0h of the thin films are clearly seen nearby 00l reflections of the substrate. Furthermore, the sharpness of the diffraction peaks of the NMO thin film with 200nm in thickness film and the fact that the h0h Bragg reflection almost coincide with 00l Bragg peaks of STO (c STO =0.3905 nm) indicates that this film is epitaxially grown on the substrate with similar orientation relationship that given or studied in the previous works [12,13]. This means that the NMO thin film with 200nm in thickness grown on the STO substrate presents a fairly good crystallinity and a strong in-plane texture with the [101]-axis perpendicular to the surface of the substrate.…”
Section: Resultssupporting
confidence: 63%
“…[1][2][3][4][5] . The radius of the rare earth element controls the bond lengths as well as the tilt of the (N iO 6 ) 3− octahedra, and hence the orbital overlap which allows a large variation in the electron interaction within the RNiO 3 family 5,6 .…”
mentioning
confidence: 99%
“…Fig. 4a shows the normalized S (2) f1 (f 2 ) of noise of the sample at different temperatures and the second spectrum was generally weakly frequency-dependent irrespective of temperature. Close to T IM it exceeds the expected Gaussian background by several orders and this indicates emergence of strong nonGaussian component of resistivity fluctuation at the PI-PM transition.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…Bragg reflections h0h of the thin films are clearly seen nearby 00l reflections of the substrate and are much more important for the 150 nm thick film. Furthermore, the sharpness of the diffraction peaks of the NMO 150 nm thick film and the fact that the h0h Bragg reflection almost coincide with 00l Bragg peaks of STO (c STO =0.3905 nm) indicates that this film is epitaxially grown on the substrate with similar orientation relationship that in the previous section [15,17]. This means that the NMO 150 nm thick film grown on the STO substrate presents a fairly good crystallinity and a strong in-plane texture with the [101]-axis perpendicular to the surface of the substrate.…”
Section: Ndmno3 Thin Filmsmentioning
confidence: 54%