2007
DOI: 10.1016/j.mseb.2007.06.026
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Synthesis and characterization of vanadium oxide films by post-oxidation and reactive sputtering

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Cited by 6 publications
(4 citation statements)
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“…120 From a practical point of view, VO 2 may be awkward to prepare since the vanadium ions are in states with intermediate oxidation and it may be more facile to fabricate materials under nonoxidizing ͑metallic V͒ or fully oxidizing ͑in-sulating V 2 O 5 ͒ conditions. The limitations are not as stringent as they may seem, though, and it should be observed that metallic vanadium can be transformed to VO 2 by controlled oxidation [121][122][123][124] and that insulating V 2 O 5 van be transformed to VO 2 by controlled reduction in films. [125][126][127] There is a tendency that limited dimensions decreases c and widens the hysteresis in nanocrystalline films 46,48,[128][129][130][131][132][133][134][135] and nanorods.…”
Section: Discussionmentioning
confidence: 99%
“…120 From a practical point of view, VO 2 may be awkward to prepare since the vanadium ions are in states with intermediate oxidation and it may be more facile to fabricate materials under nonoxidizing ͑metallic V͒ or fully oxidizing ͑in-sulating V 2 O 5 ͒ conditions. The limitations are not as stringent as they may seem, though, and it should be observed that metallic vanadium can be transformed to VO 2 by controlled oxidation [121][122][123][124] and that insulating V 2 O 5 van be transformed to VO 2 by controlled reduction in films. [125][126][127] There is a tendency that limited dimensions decreases c and widens the hysteresis in nanocrystalline films 46,48,[128][129][130][131][132][133][134][135] and nanorods.…”
Section: Discussionmentioning
confidence: 99%
“…The substrate peaks are marked by '*'. It is observed that the peaks of {00l} family correspond to the layered structure as is evident from the presence of peak corresponding to (002) [19]. The occurrence of (222) family of planes can be attributed to the oriented nature of growth.…”
Section: Resultsmentioning
confidence: 90%
“…A lot of techniques have been applied to deposit VO X thin films, such as reactive sputtering, pulsed laser deposition, sol-gel process and evaporation. Among these methods, reactive sputtering is the common method in producing VOx films because it has many advantages in process stability and production cycle time (a high deposition rate) (6).…”
Section: Introductionmentioning
confidence: 99%