The electrophoretic deposition (EPD)o fg raphenebased materials on transparent substrates is highly potential for many applications. Several factorsc an determine the yield of the EPD process,s uch as applied voltage, deposition time and particularly the presence of dispersion additives (stabilisers) in the suspension solution. This study presents an additive-free EPD of graphene quantum dot( GQD) thin films on an indium tinoxide (ITO) glass substrate and studies the deposition mechanism with the variation of the applied voltage (10-50 V) and deposition time (5-25 min). It is found that due to the small size ( % 3.9nm) and high content of deprotonatedc arboxylic groups,the GQDs form as table dis-persion (zeta-potential of about À35 mV) without using additives.T he GQD thin films can be deposited onto ITO with optimal surfacem orphologya t3 0Vin 5min (surfacer oughness of approximately (3.1 AE1.3) nm). In addition, as-fabricated GQD thin films also possess some interesting physico-optical properties, such as ad ouble-peak photoluminescence at about l = 417 and 439 nm, with approximately 98 %v isible transmittance. This low-cost and eco-friendly GQD thin film is ap romisingm aterialf or various applications,f or example,t ransparent conductors, supercapacitors and heat conductive films in smart windows.