Patterned SiC and SiCN microstructures were successfully fabricated on the silicon substrates by using polydimethylsiloxane (PDMS) elastometric stamp as template, polycarbosilane (PCS) and polysilazane (PSZ) as preceramic polymers. The preparing process was followed by precursor infiltration, the curing of the precursor, demolding of the template and pyrolysis of the cured preceramic polymer pattern. It shows that the dimensions of the ceramic patterns can be tailored by using the PDMS molds with different dimensions. The produced ceramic microstructures can be potentially applied in high temperature and high pressure environments due to the advanced properties of the SiC and SiCN ceramics.With the development of modern science and technology, the importance of small structures or microstructures (such as the fluidic nanostructure or microreactor [1] , the integrate circuit in microelectronics [2] , the factory in a chip [3,4] , etc.) has been incarnated day by day in the fields of microelectronics, micro-optical systems, microanalytical systems, microelectromechanical systems and cytobiology. And the fabrication technique (microfabrication) of the small structures has become the hotspot of the world attention accordingly, in which photolithography is the most successful technology and has dominated the development of semiconductor industry [5] . However, photolithography is poorly suited for patterning nonplanar surfaces and can generate only two-dimensional microstructures. In addition, it is blocked to generate the microstructures in nanoscale due to the limitation of optical diffraction and opacity of the materials used for making lenses or photomasks. Other advanced microfabrication techniques explored currently, such as soft X-ray lithography, electron-beam writing, focused on ion beam writing and atomic lithography, are non-photolithography that are based on electron-beam, ion beam and atom www.scichina.com www.springerlink.com Preparation of patterned SiC and SiCN microstructures 165 beam, etc. [6][7][8][9] . But the surprisingly high cost of these techniques has limited their application. Thus, new and non-traditional pattering approaches must be developed.The soft lithography technique has been demonstrated to generate high-quality microstructures since 1990 and has been paid the most attention ever since then. It is a general term of a series of soft lithography such as self-assembles monolayers [10] , replica molding [11] , microcontact printing [12] , micromolding in capillaries (MIMIC) [13] , microtranster molding (μTM) [14] and solvent-assisted micromolding [15] , etc., in which an elastomeric mold or stamp with patterned relief structures on its surface that is used to transfer and replicate the patterns is the key to soft lithography. In addition, soft lithography is being paid more and more attention due to its low cost, high efficiency, simple technics and wide applications. It fits to many kinds surfaces with different compositions and chemical properties. Temporarily, patterned polymer micros...