Polyaddition (An + B2) reactions of 1,1,1‐tris(4‐hydoxyphenyl) ethane (THPE; A3‐type monomer), calix[4]resorcinarene (CRA[4]; A8‐type monomer), α‐cyclodextrin (α‐CD; A18‐type monomer), and β‐cyclodextrin (β‐CD; A21‐type monomer) with 1,4‐bis(4‐vinyloxy)cyclohexane (BVOC; B2‐type monomer) afforded corresponding soluble hyperbranched polyacetals. The physical properties, including solubility, thermal stability, and film‐forming ability, the ultraviolet‐induced degradation reactivity, and the solubility‐switch in an extreme ultraviolet (EUV) exposure tool indicated that poly(THPE‐co‐BVOC) and poly(CRA[4]‐co‐BVOC) are candidate next‐generation photo‐resists. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 2343–2350