2004
DOI: 10.1016/j.carbon.2004.06.035
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Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

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Cited by 410 publications
(237 citation statements)
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“…37, where samples over 60cm were achieved. Plasma-enhanced CVD can be applied on substrates without catalyst 57 . Note that most as-grown CVD samples are multilayer.…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…37, where samples over 60cm were achieved. Plasma-enhanced CVD can be applied on substrates without catalyst 57 . Note that most as-grown CVD samples are multilayer.…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…The production of mono-and few layer of graphene by PECVD on different substrates like Si, SiO 2 , Al 2 O 3 , Mo, Zr, Ti, Hf, Nb, W, Ta, Cu, and 304 stainless steel. Using 900-watt RF power, 10 sccm total gas flow, and inside chamber pressure of *12 Pa, gas mixture 5-100 % CH 4 in H 2 and 600-900 substrate temperature [157]. The plasma was deposited within 5-40 min.…”
Section: Plasma-enhanced Chemical Vapor Depositionmentioning
confidence: 99%
“…These CNS were grown by plasma-assisted chemical vapor deposition (CVD) on a conducting substrate as a model system for graphene. 20 The CNS, consist of 1µm graphene sheets protruding from a 20 nm layer of graphite. The estimated thickness is 2-3 graphene layers at the top and about 7 monolayers in the vicinity of the substrate.…”
Section: Experimental Verification a Graphene Model Systemmentioning
confidence: 99%