This paper investigates a plasma discharge driven by a 13.56 MHz radio frequency (RF) power supply at atmospheric pressure, in which a copper wire is inserted in the discharge tube for the deposition of Cu films. The results show that the jet plasma formation originates from the discharge between the copper wire and induction coil because of its electrostatic field. The axial distribution of the plasma parameters in the RF plasma jet, namely the gas temperature, excitation temperature, and electron number density, is determined by diatomic molecule OH fitting, Boltzmann slope, and H Stark broadening, respectively. The discharge current significantly declines when a small amount of hydrogen is added to the argon as the plasma-forming gas, and the gas temperature of discharge plasma increases considerably. KEYWORDS discharge mode, plasma parameters, RF-driven plasma
INTRODUCTIONAtmospheric-pressure plasma jets (PJs) have been attracting great attention in the field of material preparation, [1,2] biomedicine, [3,4] and material surface modification [5,6] because of their simple structure, without spatially bounded by electrodes, and the avoidance of complex vacuum system requirements. In the application of material preparation, plasma wire deposition is a simple and effective method for film deposition, [7] nanomaterial preparation, [8] and additive layer manufacture, [9,10] in which case a metal wire, used as a source material or precursor, is inserted into plasma. Through the interaction between the plasma and the wire, the metal is etched and/or evaporated in the plasma, and then quickly cools and nucleates in the PJ due to high temperature gradient. Jhavar et al. [9,10] employed the micro-plasma transferred arc wire deposition for additive layer manufacturing, which was demonstrated to be cost effective, energy efficient, and environmentally friendly, providing a multi-track-deposited surface without any defects. Shimizu et al. developed a novel method to prepare gold nanoparticles by wire-spraying employing a room-temperature atmospheric H 2 /Ar micro-PJ driven by a pulsing ultrahigh frequency, which is quite different from arc wire deposition. [11] We [12][13][14] had also developed a technique for depositing Cu thin films on polyimide by using an RF-driven PJ (RF-PJ) in which a copper wire is set inside a quartz tube as the Cu source. It was demonstrated that this was a novel and successful method for pure Cu thin film deposition, since a high-quality Cu film with relatively high deposition rate could be obtained at a relatively low temperature and in a short residence time in the plasma. In these applications, the characteristics of the plasma are important to understand the interaction between the plasma and the metal wire. For this purpose, the discharge mode and the plasma properties of the RF-PJ with a copper wire in the tube are investigated in this paper.
EXPERIMENTAL SET-UPThe schematic diagram of the experimental set-up is shown in Figure 1. The plasma source is structurally identical to an inductive...