In recent years, transition metal dichalcogenide (TMD)-based
electronics
have experienced a prosperous stage of development, and some considerable
applications include field-effect transistors, photodetectors, and
light-emitting diodes. Chemical vapor deposition (CVD), a typical
bottom-up approach for preparing 2D materials, is widely used to synthesize
large-area 2D TMD films and is a promising method for mass production
to implement them for practical applications. In this review, we investigate
recent progress in controlled CVD growth of 2D TMDs, aiming for controlled
nucleation and orientation, using various CVD strategies such as choice
of precursors or substrates, process optimization, and system engineering.
We then survey different patterning methods, such as surface patterning,
metal precursor patterning, and postgrowth sulfurization/selenization/tellurization,
to mass produce heterostructures for device applications. With these
strategies, various well-designed architectures, such as wafer-scale
single crystals, vertical and lateral heterostructures, patterned
structures, and arrays, are achieved. In addition, we further discuss
various electronics made from CVD-grown TMDs to demonstrate the diverse
application scenarios. Finally, perspectives regarding the current
challenges of controlled CVD growth of 2D TMDs are also suggested.