2021
DOI: 10.1016/j.cej.2020.127014
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Synthesis of large-area graphene films on rolled-up Cu foils by a “breathing” method

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Cited by 22 publications
(12 citation statements)
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“…Due to the advantages of low cost, simple preparation process, strong controllability, and mass production, together with the obvious catalytic effect of a metal substrate on graphene growth, the CVD method has become the mainstream method for the preparation of large-area, high-quality graphene on metal substrates and has been developed to a relatively mature stage. [34][35][36][37][38][39][40][41][42][43][44][45][46][47][178][179][180][181][182][183][184][185] However, the CVD growth strategy of Gr-PCFs is challenging due to the lack of a metal catalyst and the difficulty in gas flow control along the long micrometer-sized holes in a silica PCF. The successful growth of Gr-PCFs benefits from extensive experience in the CVD growth of graphene glass/ insulator substrates.…”
Section: The Growth Of Graphene On Glassmentioning
confidence: 99%
“…Due to the advantages of low cost, simple preparation process, strong controllability, and mass production, together with the obvious catalytic effect of a metal substrate on graphene growth, the CVD method has become the mainstream method for the preparation of large-area, high-quality graphene on metal substrates and has been developed to a relatively mature stage. [34][35][36][37][38][39][40][41][42][43][44][45][46][47][178][179][180][181][182][183][184][185] However, the CVD growth strategy of Gr-PCFs is challenging due to the lack of a metal catalyst and the difficulty in gas flow control along the long micrometer-sized holes in a silica PCF. The successful growth of Gr-PCFs benefits from extensive experience in the CVD growth of graphene glass/ insulator substrates.…”
Section: The Growth Of Graphene On Glassmentioning
confidence: 99%
“…For a long time, CVD was considered to be the most promising method for preparing large-area high-quality graphene films. However, as the size of the reactor increases, there are significant increases in manufacturing difficulties and the cost of CVD reactors, which in turn lead to limitations on the size and throughput of graphene films [ 39 ]. In addition, the high-temperature CVD growth of graphene is accompanied by some side reactions, leading to a large amount of amorphous carbon contaminants being deposited on the surface of graphene, leading to “intrinsic pollution” of the graphene film, which seriously affects the performance of graphene.…”
Section: Two-dimensional Graphenementioning
confidence: 99%
“…Currently, there is still a large discrepancy between the measured performance of graphene films and the values expected from theory, indicating that research is required to improve the performance of graphene films [ 40 , 41 ]. Wang et al [ 39 ] reported a “breathing” CVD method, in which a spiral Cu foil as substrate is employed to increase the loading density. In this process, graphite spacers are placed between the Cu layers at both ends of the spiral to prevent the Cu layers from adhering together at high temperature.…”
Section: Two-dimensional Graphenementioning
confidence: 99%
“…To address the issue, the Li group developed a strategy of rolling copper in a vertical direction to realize the growth of the meter level (1.1 m × 0.25 m) graphene film in a 2 inches diameter CVD reactor. 118 During this process, the Cu foil was rolled into a spiral shape and loaded vertically, and the gas was introduced in a breathing way through repeatedly increasing and decreasing the pressure inside the reactor. By means of this method, the throughput of materials including other 2D materials could be improved with little influence from the size of the CVD reactor.…”
Section: Perspective and Prospectsmentioning
confidence: 99%