L1 0 -orderd FeNi alloy films with a high degree of order (S) and a large uniaxial magnetic anisotropy energy (K u ) were realized by denitriding FeNiN films. FeNiN films with the a-axis perpendicular to the film plane were epitaxially grown on SrTiO 3 (001) substrates by molecular beam epitaxy by changing the growth temperatures (T S ) to 200, 250, and 350 C. The a-axis oriented epitaxial L1 0 -FeNi films were fabricated by annealing the FeNiN films in a H 2 gas atmosphere at 300 C. S and K u of the denitrided L1 0 -FeNi films were characterized by anomalous x-ray diffraction using synchrotron radiation and magnetic torque measurements, respectively. A high S of 0.87 and a K u of 5.9 Â 10 5 J/m 3 were realized in the L1 0 -FeNi film with a T S of 350 C. This high S value exceeds the values reported on L1 0 -FeNi to date, but the K u value was comparable to those of c-axis oriented L1 0 -FeNi films with S $ 0.5 grown by alternate monoatomic deposition of Fe and Ni layers. A possible origin for the suppressed macroscopic K u in a-axis oriented L1 0 -FeNi films is discussed, and denitriding FeNiN is a promising method for the fabrication of L1 0 -FeNi with a high S and a large K u .