Synthesis of silicon oxynitride from a polymeric precursor

Yu, Ga Er; Edirisinghe, Mohan; Finch, Dudley S.; Ralph, B.; Parrick, J.

doi:10.1007/bf00351546

Cited by 10 publications

(7 citation statements)

References 8 publications

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“…show a unique high-temperature stability in terms of restricting crystallization and subsequent phase partitioning under an inert atmosphere of N 2 or Ar [20,21]. On the other hand, very limited study has been done for the crystallization behavior of polymer-derived ternary Si–O–N or quaternary Si–O–C–N systems [22,24]. Therefore, high-temperature crystallization behavior above 1000 °C of the present EtOSZ-derived amorphous Si–O–C–N was further studied.…”

Section: Resultsmentioning

confidence: 99%

“…Moreover, polymerization and cross-linking provide a means to vary the specific properties of the pre-ceramic compounds, such as solubility, fusibility, or viscosity, extensively providing the versatility in processing and shaping capabilities, including thin film and long fiber syntheses that are similar to that successfully achieved with polymer materials. In this route, copolymers of the methylcyclosiloxanes and methylcyclolosilazanes [22], poly(Si-isocyanato-Si-methylpolysilazane) [23], and polysilyloxycarbodiimide [24] were synthesized and successfully converted to both amorphous SiO x N y and crystalline Si 2 N 2 O. Perhydropolysilazane (–SiH 2 –NH–) was also found as a useful starting polymer to fabricate dense and hydrophilic SiO x N y bond coat in a double-layer EBC system, which showed outstanding performance in long-term static oxidation tests at 800 °C [25]. …”

Section: Introductionmentioning

confidence: 99%

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Synthesis of a Novel Polyethoxysilsesquiazane and Thermal Conversion into Ternary Silicon Oxynitride Ceramics with Enhanced Thermal Stability

et al. 2017

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A novel polyethoxysilsesquiazane ([EtOSi(NH)1.5]n, EtOSZ) was synthesized by ammonolysis at −78 °C of ethoxytrichlorosilane (EtOSiCl3), which was isolated by distillation as a reaction product of SiCl4 and EtOH. Attenuated total reflection-infra red (ATR-IR), 13C-, and 29Si-nuclear magnetic resonance (NMR) spectroscopic analyses of the ammonolysis product resulted in the detection of Si–NH–Si linkage and EtO group. The simultaneous thermogravimetric and mass spectrometry analyses of the EtOSZ under helium revealed cleavage of oxygen-carbon bond of the EtO group to evolve ethylene as a main gaseous species formed in-situ, which lead to the formation at 800 °C of quaternary amorphous Si–C–N with an extremely low carbon content (1.1 wt %) when compared to the theoretical EtOSZ (25.1 wt %). Subsequent heat treatment up to 1400 °C in N2 lead to the formation of X-ray amorphous ternary Si–O–N. Further heating to 1600 °C in N2 promoted crystallization and phase partitioning to afford Si2N2O nanocrystallites identified by the XRD and TEM analyses. The thermal stability up to 1400 °C of the amorphous state achieved for the ternary Si-O-N was further studied by chemical composition analysis, as well as X-ray photoelectron spectroscopy (XPS) and 29Si-NMR spectroscopic analyses, and the results were discussed aiming to develop a novel polymeric precursor for ternary amorphous Si–O–N ceramics with an enhanced thermal stability.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Synthesis of a Novel Polyethoxysilsesquiazane and Thermal Conversion into Ternary Silicon Oxynitride Ceramics with Enhanced Thermal Stability

et al. 2017

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“…Besides, the intensity of NH diminished, which was caused by the release of ammonia at about 150–500°C 20. As shown in Figure 5 (Curve d), the intensity of SiCH 3 decreased, and the peaks of CH 3 and CH 2  disappeared due to the free radical reaction that occurred at the temperature of 400–800°C,21 whereas the peak of SiH appeared again, which is probably owing to the decomposition of SiCH 3 into SiH 10. As shown in Figure 5 (Curve f), when the precursors were pyrolyzed at 1000°C, the organic groups completely disappeared and the structure for ceramics was fully formed.…”

Section: Resultsmentioning

confidence: 91%

The synthesis of SiCON ceramics through precursor method

Luo

Zhang

Liu

et al. 2012

J of Applied Polymer Sci

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A polymeric precursor, polysiloxazane (PSON), for SiCON ceramics has been synthesized by the partial hydrolysis of MeViSiCl 2 , MeHSiCl 2 , and MeSiCl 3 followed by ammonolysis reaction of the hydrolyzed intermediates with NH 3 . The structure and thermal properties of the polymeric precursor were investigated by means of Fourier transfer infrared spectra (FTIR), 1 H-NMR, 29 Si-NMR, gel permeation chromatography, and thermogravimetric analysis. The structure of the SiCON ceramics derived from the pyrolysis of PSON was characterized by FTIR and X-ray diffraction. The as-synthesized PSON produced mainly a-Si 3 N 4 crystalline phase during pyrolysis at 1500 C under N 2 atmosphere, whereas when pyrolyzed at 1500 C under Ar atmosphere, crystalline phases of a/b-SiC and/or a-Si 3 N 4 were detected. V C 2012 Wiley Periodicals, Inc. J fAppl Polym Sci 126: [853][854][855][856][857][858][859] 2012

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“…The ceramic has found versatile applications in the fields of high‐temperature resistant ceramic composite, high‐performance fiber, and dielectric film 2–5. Various approaches to silicon oxynitride ceramic, for example, nitridation of silicon or silicon dioxide at elevated temperature,6, 7 solid‐phase reaction between silicon nitride and silicon dioxide aided by metal oxides,8–10 Chemical vapor deposition (CVD) process,5 and polymeric precursor route11–16 have been reported. Among them, the polymeric precursor route, namely fabrication of ceramics by pyrolysis of polymeric precursor, has drawn great interest in recent years.…”

Section: Introductionmentioning

confidence: 99%

“…The reported polymeric precursors for the ceramic generally contain organic groups. For example, by pyrolysis of the copolymer synthesized from polymethylsiloxane and polymethylsilazane at 1660°C under N 2 atmosphere, Yu et al obtained α‐Si 3 N 4 /Si 2 N 2 O composite 11–14. While Gunji et al prepared Si 2 N 2 O ceramic upon treatment of an isocyanato group‐containing polymeric precursor above 900°C under NH 3 or N 2 atmosphere 15.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and thermal behavior of polymeric precursor for carbon‐free silicon oxynitride ceramic

Zhang

Wang

et al. 2011

J of Applied Polymer Sci

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A new polymeric precursor, perhydropolysiloxazane (PSNO), for silicon oxynitride (SiON) ceramic was synthesized by a simple one-pot procedure involving partial hydrolysis of H 2 SiCl 2 and the following ammonolysis reaction of the hydrolyzed intermediates with NH 3 . The structure of new polymer was characterized with perhydropolysiloxane (PHSO) and perhydropolysilazane (PHSN) as reference substances. The conversion of PSNO to ceramic was investigated by TGA, FT-IR, and solid 29 Si-NMR analyses. A Si-rich Si 2 N 2 O ceramic was produced upon pyrolysis of PSNO at 1400 C under N 2 atmosphere.

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Synthesis of silicon oxynitride from a polymeric precursor

Cited by 10 publications

References 8 publications

Synthesis of a Novel Polyethoxysilsesquiazane and Thermal Conversion into Ternary Silicon Oxynitride Ceramics with Enhanced Thermal Stability

Synthesis of a Novel Polyethoxysilsesquiazane and Thermal Conversion into Ternary Silicon Oxynitride Ceramics with Enhanced Thermal Stability

The synthesis of SiCON ceramics through precursor method

Synthesis and thermal behavior of polymeric precursor for carbon‐free silicon oxynitride ceramic

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