Synthesis of Teflon-like Thin Layers under Perfluoro-1-butanesulfonyl Fluoride/Methane Radio Frequency Plasma Environments

Abstract

Teflon-like thin layers were deposited on various substrate surfaces from perfluoro-1-butanesulfonyl fluoride/methane radio frequency pulsed plasma environments. The deposited films were characterized using attenuated total reflectance Fourier transform infrared spectroscopy, electron spectroscopy for chemical analysis, differential thermal analysis/thermogravimetric analysis (DTA/TG), and atomic force microscopy techniques. It has been demonstrated that the presence of methane is crucial for the deposition of fluorinated structures due to the simultaneously developed and fluorine atoms controlled competitive etching and deposition processes. It has been shown that plasma films with the highest fluorine concentrations can be generated under low duty cycle and high methane partial pressure conditions. DTA/TG data indicate that the Teflon-like layers have a fairly high thermal stability.

Sisal chemo‐thermomechanical pulp paper with a strongly hydrophobic surface coating produced by a pentafluorophenyldimethylsilane cold plasma

“…ATR FT-IR analysis of CTMP paper Figure 2 shows the Attenuated Total Reflectance Fourier Transform Infrared (ATR FT-IR) spectra for the unbleached sisal CTMP paper before and after PFPDMS-plasma treatment. Figure 3 shows the high resolution ATR FT-IR differential spectrum from Figure 2 revealing considerable differences in certain bands [18][19][20][21][22][23] as summarized in Table I. It confirms the presence of aromatic rings at 1682, 1655 and 1457 cm À1 , C¼ ¼C (stretching), SiACH 3 groups at 1260 cm À1 and 1057 cm À1 , SiAOAC bonds at 798 cm À1 and probably SiAOH at 602.32 cm À1 .…”