Systematic review of the chemical composition of contemporary dental adhesives

Landuyt, Kirsten Van; Snauwaert, J.; Munck, Jan De; Peumans, Marleen; Yoshida, Yasuhiro; Poitevin, André; Coutinho, Eduardo; Suzuki, Kazuomi; Lambrechts, Paul; Meerbeek, Bart Van

doi:10.1016/j.biomaterials.2007.04.044

Cited by 1,149 publications

(1,313 citation statements)

References 159 publications

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“…Earlier studies found that the resin with high penetration coefficients could penetrate deeper inside the lesion 20,21) . The ICON resin monomer (TEGDMA) contains no functional group in the molecule to exert strong chemical bonding performance to the apatite surface such as esterized phosphate, e.g., methacryloyloxydecyl dihydrogen phosphate (MDP) 22) and carboxy groups e.g., 4-methacryloxyethyl trimellitate anhydride (4-META) 23) . Thus, it is believed that TEGDMA does not have the ability to adhere to teeth 24) .…”

Section: Discussionmentioning

confidence: 99%

Effect of thermal cyclic stress on acid resistance of resin-infiltrated incipient enamel lesions <i>in vitro </i>

et al. 2016

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This study aimed to examine the effect of thermal cycling on gap formation at the interface between infiltrated resin (ICON ® ) and enamel lesion and on the durability of anti-demineralization efficacy to predict the future performance. SS-OCT technique was examined to determine whether it has the potential to detect the gap. Bovine enamel lesions were prepared, and the infiltrated resin was applied to the lesion. Resin-infiltrated lesion specimens were thermal cycled 10,000 cycles and further demineralized in pH 4.5 buffer for 7 days. Released Ca (mg/cm 2 ) was quantified by Ca electrode. The SS-OCT technique was applied to detect the gap, and SEM observation was performed to determine the presence of the gap. There was no significant difference in the amount of Ca release before and after the thermal cycling, suggesting long-lasting anti-demineralization efficacy of the resin. SS-OCT and SEM observations indicated no apparent gap formation after the thermal cycling.

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Section: Discussionmentioning

confidence: 99%

Effect of thermal cyclic stress on acid resistance of resin-infiltrated incipient enamel lesions <i>in vitro </i>

et al. 2016

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“…oxidation of residual monomer) [9,10]. In this respect, the resin matrix composition with its hydrophilicity/hydrophobicity, filler load, size and nature of the particles [11], quantity of photo-initiator or inhibitor [12] and degree of conversion [13] have a strong influence on the stain intensity of composite resin.…”

Section: Introductionmentioning

confidence: 99%

Stain susceptibility of composite and ceramic CAD/CAM blocks versus direct resin composites with different resinous matrices

et al. 2016

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To evaluate the stain susceptibility of CAD/ CAM blocks and direct composite after long term exposure to various staining agents. 40 disk-shaped samples were fabricated from each of nine materials; six CAD/CAM (Vitablocs Mark II, Paradigm MZ100, Experimental Vita Hybrid Ceramic, Vita Enamic, Experimental Kerr and Lava Ultimate) and three direct composites (Filtek Supreme, Venus Diamond and Filtek Silorane). Samples were randomly divided into five groups (n = 8) according to different staining solutions (distilled water, tea, red wine, coffee and artificial saliva). Initial L*a*b* values were assessed using a calibrated digital spectrophotometer. Specimens were immersed in staining solutions and stored in an incubator at 37°C for 120 days. L*a*b* values were assessed again and color change (DE) was calculated as difference between recorded L*a*b* values. ANOVA, and Duncan test were used to identify differences between groups (a = 0.05). Significant differences in DE values were detected between materials (p = 0.000). Among all staining solutions, the highest DE value was observed with red wine. The new CAD/CAM blocks (Vita Enamic, Vita Hybrid Ceramic and Lava Ultimate) showed the highest resistance to staining compared to the MZ100 composite resin blocks. Filtek Silorane, a direct composite, showed high stain resistance values compared to CAD/CAM materials and other direct composites. Ceramic and composite CAD/CAM blocks had lower staining susceptibility than methacrylate based direct composite. Staining susceptibility of the new resin based CAD/CAM materials Vita Enamic and Lava Ultimate was comparable to feldspathic ceramic blocks (Vitablocs Mark II). Filtek Silorane showed promising results that were comparable to some CAD/CAM blocks.

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“…TMSBr was distilled prior to use. KOCN and NBu 4 Br were dried at 100°C under vacuum (0.1 mbar for KOCN and 3 mbar for NBu 4 Br) for 4 h prior to use. IEM was purchased from ABCR (Germany).…”

Section: Methodsmentioning

confidence: 99%

“…[2][3][4] Contrary to the total-etch systems, which require the use of a phosphoric acid gel prior to the application of the adhesive, SEAs do not need a separate etching step. SEAs are aqueous solutions containing an acidic monomer (carboxylic acid, dihydrogen phosphate, phosphonic acid) as well as various monofunctional and crosslinking comonomers.…”

Section: Introductionmentioning

confidence: 99%

Monomers for adhesive polymers, 13.¹ Synthesis, radical photopolymerization and adhesive properties of polymerizable 2-substituted 1,3-propylidenediphosphonic acids

Catel

Fischer

Moszner

2013

Designed Monomers and Polymers

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A family of polymerizable 2-substituted-1,3-propylidenediphosphonic acids was successfully synthesized for an application in dental adhesives. Methacrylates as well as N-alkyl-acrylamides were prepared. Those monomers were synthesized in 4 to 6 steps and were fully characterized by 1 H NMR, 13 C NMR, 31 P NMR spectroscopy and by HRMS. In order to evaluate their reactivity, the copolymerization of each monomer with N,N'-diethyl-1,3-bis-(acrylamido)-propane (DEBAAP) in DMF was investigated by photo-DSC. Bis-(4-methoxybenzoyl)diethylgermanium (BMDG) was added as the photoinitiator to each mixture of acidic monomer/DEBAAP/DMF (2/3/5: mol/mol/mol). It was demonstrated that each monomer efficiently copolymerized with DEBAAP. Self-etching enamel-dentin adhesives containing these new diphosphonic acids were formulated and used to mediate a bond between the dental hard tissues (dentin and enamel) and a restorative material. According to both dentin and enamel shear bond strength measurements, 2-methacryloyloxymethyl-1,3-propylidenediphosphonic acid 8, 2-[N-(2-methacryloyloxyethyl)-carbamoyloxymethyl]-1,3-propylidenediphosphonic acid 10a and 2-[N-(10-methacryloyloxydecyl)-carbamoyloxymethyl]-1,3-propylidenediphosphonic acid 10b were the best candidates to enter new formulations. Those diphosphonic acids were significantly more efficient regarding the etching of enamel than the 1,3-bis(methacrylamido)propane-2-yl dihydrogen phosphate 17, a monomer already used in some commercially available dental formulations.

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Systematic review of the chemical composition of contemporary dental adhesives

Cited by 1,149 publications

References 159 publications

Effect of thermal cyclic stress on acid resistance of resin-infiltrated incipient enamel lesions <i>in vitro </i>

Effect of thermal cyclic stress on acid resistance of resin-infiltrated incipient enamel lesions <i>in vitro </i>

Stain susceptibility of composite and ceramic CAD/CAM blocks versus direct resin composites with different resinous matrices

Monomers for adhesive polymers, 13.¹ Synthesis, radical photopolymerization and adhesive properties of polymerizable 2-substituted 1,3-propylidenediphosphonic acids

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Systematic review of the chemical composition of contemporary dental adhesives

Cited by 1,149 publications

References 159 publications

Effect of thermal cyclic stress on acid resistance of resin-infiltrated incipient enamel lesions <i>in vitro </i>

Effect of thermal cyclic stress on acid resistance of resin-infiltrated incipient enamel lesions <i>in vitro </i>

Stain susceptibility of composite and ceramic CAD/CAM blocks versus direct resin composites with different resinous matrices

Monomers for adhesive polymers, 13.1 Synthesis, radical photopolymerization and adhesive properties of polymerizable 2-substituted 1,3-propylidenediphosphonic acids

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Monomers for adhesive polymers, 13.¹ Synthesis, radical photopolymerization and adhesive properties of polymerizable 2-substituted 1,3-propylidenediphosphonic acids