This work presents a simple, fast (20 min treatment), inexpensive, and highly efficient method for synthesizing nitrogen-doped titanium dioxide (N-TiO 2 ) as an enhanced visible light photocatalyst. In this study, N-TiO 2 coatings were fabricated by atmospheric pressure dielectric barrier discharge (DBD) at room temperature. The composition and the chemical bonds of the TiO 2 and N-TiO 2 coatings were characterized by X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). The results indicate that the nitrogen element has doped the TiO 2 lattice, which was further confirmed by Raman spectroscopy and grazing incidence X-ray diffraction (GIXRD). The doping mechanism was investigated using OES to study the plasma properties under different conditions. It suggests that the NH radicals play a key role in doping TiO 2 . The concentration of nitrogen in the N-TiO 2 coatings can be controlled by changing the concentration of NH 3 in the plasma or the applied power to adjust the concentration of NH radicals in the plasma. The band gap of N-TiO 2 was reduced after NH 3 /Ar plasma treatment from 3.25 to 3.18 eV. Consequently, the N-TiO 2 coating showed enhanced photocatalytic activity under white-light-emitting-diode (LED) irradiation. The photocatalytic degradation rate for the N-TiO 2 coating was about 1.4 times higher than that of the undoped TiO 2 coating.