Technical note: Point‐by‐point ion‐recombination correction for accurate dose profile measurement in high dose‐per‐pulse irradiation field

Abstract

BackgroundAlthough flattening filter free (FFF) beams are commonly used in clinical treatment, the accuracy of dose measurements in FFF beams has been questioned. Higher dose per pulse (DPP) such as FFF beams from a linear accelerator may cause problems in dose profile measurements using an ionization chamber due to the change of the charge collection efficiency. Ionization chambers are commonly used for percent depth dose (PDD) measurements. Changes of DPP due to chamber movement during PDD measurement can vary the ion collection efficiency of ionization chambers. In the case of FF beams, the DPP fluctuation is negligible, but in the case of the FFF beams, the DPP is 2.5 ∼ 4 times larger than that of the FF beam, and the change in ion collection efficiency is larger than that of the FF beam. PDD profile normalized by maximum dose depth, 10 cm depth for example, may therefore be affected by the ion collection efficiency.PurposeIn this study, we investigate the characteristics of the ion collection efficiency change depending on the DPP of each ionization chamber in the FFF beam. We furthermore propose a method to obtain the chamber‐ independent PDD by applying a DPP‐dependent ion recombination correction.MethodsPrior to investigating the relationship between DPP and charge collection efficiency, Jaffe‐plots were generated with different DPP settings to investigate the linearity between the applied voltage and collected charge. The absolute dose measurement using eight ionization chambers under the irradiation settings of 0.148, 0.087, and 0.008 cGy/pulse were performed. Applied voltages for the Jaffe‐plots were 100, 125, 150, 200, 250, and 300 V. The ion recombination correction factor Pion was calculated by the two‐voltage analysis (TVA) method at the applied voltages of 300 and 100 V. The DPP dependency of the charge collection efficiency for each ionization chamber were evaluated from the DPP‐ Pion plot. PDD profiles for the 10 MV FFF beam were measured using Farmer type chambers (TN30013, FC65‐P, and FC65‐G) and mini‐type chambers (TN31010, TN31021, CC13, CC04, and FC23‐C). The PDD profiles were corrected with ion recombination correction at negative and positive polar applied voltages of 100 and 300 V.ResultsFrom the DPP‐Pion relation for each ionization chamber with DPP ranging from 0.008 cGy/pulse to 0.148 cGy/pulse, all Farmer and mini‐type chambers satisfied the requirements described in AAPM TG‐51 addendum. However, Pion for the CC13 was most affected by DPP among tested chambers. The maximum deviation among PDDs using eight ionization chambers for 10 MV FFF was about 1%, but the deviation was suppressed to about 0.5% by applying ion recombination correction at each depth.ConclusionsIn this study, the deviation of PDD profile among the ionization chambers was reduced by the ion recombination coefficient including the DPP dependency, especially for high DPP beams such as FFF beams. The present method is particularly effective for CC13, where the ion collection efficiency is highly DPP dependent.