In this paper the results of substrate temperature effects on average grain size in FeNi 20:80 are shown. It was found that with an increase of the substrate temperature from 270 to 390 °C, the anisotropic magnetoresistive (AMR) effect increases from 1.2 to 2.3% and the coercive force from 1.6 to 5.3 Oe. The presence of two conflicting processes: the task of increasing AMR effect to achieve high sensitivity of AMR-sensor and to decrease the coercive force to increase the precision of conversion, leads to the necessity to find the optimum deposition temperature of the permalloy film. The dependence of the AMR effect and the coercive force on the substrate temperature during deposition was obtained. This dependence shows that the substrate temperature increasing above 320 °C leads to coercive force increasing and does not lead to a substantial AMR increasing. In this regard, the substrate temperature 320 °C was determined as optimal.