Advances in Resist Technology and Processing XVII 2000
DOI: 10.1117/12.388269
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Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics

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Cited by 6 publications
(2 citation statements)
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“…PAG B has an adamantyl group as a stopper unit, which is bulky and rigid, PAG C has a n-decyl group as a stopper unit, which is linear and flexible (PAGs B and C have different stopper units, but the rest of their structure is the same). From the standpoint of the free volume of polymers, 11) if the n-decyl group of PAG C aggregates intramolecularly in a resist matrix, the acid diffusion coefficients (D) of PAGs B and C have no marked difference. However, although the acid diffusion stopper units of both PAGs consisted of the same number of carbons, their acid diffusion coefficients (D) had differences of more than 10-fold (Table I).…”
Section: Effect Of Acid Diffusion Stopper Unitmentioning
confidence: 99%
“…PAG B has an adamantyl group as a stopper unit, which is bulky and rigid, PAG C has a n-decyl group as a stopper unit, which is linear and flexible (PAGs B and C have different stopper units, but the rest of their structure is the same). From the standpoint of the free volume of polymers, 11) if the n-decyl group of PAG C aggregates intramolecularly in a resist matrix, the acid diffusion coefficients (D) of PAGs B and C have no marked difference. However, although the acid diffusion stopper units of both PAGs consisted of the same number of carbons, their acid diffusion coefficients (D) had differences of more than 10-fold (Table I).…”
Section: Effect Of Acid Diffusion Stopper Unitmentioning
confidence: 99%
“…It is useful to examine a few examples of each of the different types of photoresist models commonly used by lithographers today. Molecular-scale models of the photoresist include dynamic Monte-Carlo [2], molecular dynamics [3,4], and ab initio quantum calculations [5][6][7]. These models are useful for developing a deeper understanding of resist chemistry and physics from a molecular standpoint, and these models can be used to examine new resist formulations.…”
Section: Introductionmentioning
confidence: 99%