Superlattices may play an important role in next generation electronic and spintronic devices if the key-challenge of the reading and writing data can be solved. This challenge emerges from the coupling of low dimensional individual layers with macroscopic world. Here we report the study of the resistive switching characteristics of a of hybrid structure made out of a superlattice with ultrathin layers of two ferromagnetic metallic oxides, La 0.7 Sr 0.3 MnO 3 (LSMO) and SrRuO 3 (SRO). Bipolar resistive switching memory effects are measured on these LSMO/SRO superlattices, and the observed switching is explainable by ohmic and space charge-limited conduction laws. It is evident from the endurance characteristics that the on/off memory window of the cell is greater than 14, which indicates that this cell can reliably distinguish the stored information between high and low resistance states. The findings may pave a way to the construction of devices based on nonvolatile resistive memory effects. Figure 1. Misfit dislocations were found at the interfaces between the La 0.7 Sr 0.3 MnO 3 and SrRuO 3 layers. However, the interfacial atomic layers were affected by intermixing; both A-site (La/Sr) and B-site (Mn/Ru) cations intermix in 1-2 unit cells across the interface, as marked by the rectangles in Fig 1(b). The contacts ( Fig. 1(a)) to the top layer were made by the wire bonder, the distance between two planar electrodes is 1 mm.
KeywordsUsing Keithley 2400, two probe method was employed in order to measure I -V characteristics.All the measurements were carried out at room temperature. Top SRO layer showed the resistance ~ KâŠ. At this point it is worth quoting about the nature of SRO layer with different superlattice structures where essentially SRO layer behaved vividly in its bulk and ultra-thinfilm form. On top of that in general an important issue on using ultrathin films of metal oxides is the significant enhancement in the resistivity, which has been clearly manifested in SRO thin films [19][20][21][22] .Before the forming process, resistive switching at low voltages is not consistently observed in LSMO/SRO superlattice, between -1 V and +1 V. In order to make filaments between the electrodes, I -V characteristics were measured by sweeping voltage from 0 to 20 V with a current compliance of 10 mA. Essentially, the electro-forming process is necessary to get a stable and reproducible resistive switching behavior in the resistive switching devices. Compliance current of 10 mA is used to avoid the dielectric break down of the device during the forming process due to leakage current which may arise by the application of very high voltages.Essentially, during this process, current -limited electric breakdown is induced in the Fig. 2(b) shows the same graph in logarithmic plot. As soon as we increased the compliance limit until 100 mA, we could see dielectric breakdown in the device. Hence, we fixed the compliance limit to 10 mA for all the devices.To probe the current conduction mechanism of LSMO/SRO superlattice...