Temperature Dependence of the Electrical Resistivity of Polymerized C₆₀ Thin Films

Abstract

Highly conducting thin films of C60 were deposited by thermal evaporation in high vacuum on single crystal silicon substrates. The microstructure of the films was characterized by using Atomic Force Microscopy, and laser Raman spectroscopy. The films were polymerized by uv irradiation. The dc electrical resistivities of the as-deposited and uv-polymerized films were measured as functions of temperature between 295 and 17K by the four-probe technique. We present results on the effects of uv-irradiation on the surface microstructure and the temperature dependence of the electrical resistivity of these films.