For vertical-cavity surface-emitting lasers (VCSELs)
or photoelectrochemical
devices and high efficient III-V/Ge(100) photovoltaics, preparation
of double-atomic steps on Ge(100) substrates is highly recommended
in order to avoid anti-phase boundaries in the III-V buffer layers.
These Ge(100) surfaces were investigated in detail under As- and GaAs-rich
MOVPE reactor conditions. During initial growth of III-P buffer layers,
however, on an atomically well-ordered Ge(100):As surface, As-P exchange
takes place, during which double-layer steps should be preserved.
Here, we apply in situ monitoring to study the interaction of P with
vicinal Ge(100):As surfaces under realistic, GaAs-rich CVD reactor
conditions at growth temperature. In situ optical spectroscopy in
combination with surface science techniques in ultra-high vacuum ambience
is used to investigate the Ge(100) surface. We show that different
Ge(100):As/P heterointerfaces are formed depending on the applied
molar flow of phosphorus precursors. Despite the lattice-matched quality
of the probing III-P layer, this critical heterointerface impacts
significantly the surface roughness and the formation of crystal defects
in the subsequently grown III-P buffer layers.