2007
DOI: 10.1063/1.2769284
|View full text |Cite
|
Sign up to set email alerts
|

Temperature-dependent behavior of Ni/4H-nSiC Schottky contacts

Abstract: The current-voltage (I-V) characteristics of Ni/4H-nSiC Schottky diodes have been measured in the temperature range of 180–300 K with a temperature step of 20 K. An experimental barrier height (BH) Φap value of about 1.32 eV was obtained for the Ni/4H-nSiC Schottky diode at the 300 K. A decrease in the experimental BH Φap and an increase in the ideality factor n with a decrease in temperature have been explained on the basis of a thermionic emission mechanism with Gaussian distribution of the barrier heights d… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

3
52
0

Year Published

2008
2008
2014
2014

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 78 publications
(55 citation statements)
references
References 51 publications
3
52
0
Order By: Relevance
“…This suggested inhomogeneity at the Ge/SiC heterojunction interface, similar to several metal-semiconductor studies over the last two decades [8][9][10][11][12][13][14][15][16][17][18] . Inhomogeneities are imperfections at the interface between two materials.…”
Section: Introductionmentioning
confidence: 54%
See 3 more Smart Citations
“…This suggested inhomogeneity at the Ge/SiC heterojunction interface, similar to several metal-semiconductor studies over the last two decades [8][9][10][11][12][13][14][15][16][17][18] . Inhomogeneities are imperfections at the interface between two materials.…”
Section: Introductionmentioning
confidence: 54%
“…Metal deposition, usually sputtering, and subsequent annealing produce a patched interface containing a mix of species and alloys [8][9][10] . Representative of this is the well known Ni-Ti based contact structure on 4H-SiC 36,37 .…”
Section: A Comparison Of the Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…This increase in barrier height with increasing temperature is the same behavior at the forward bias, where the thermionic model is used. The authors attributed this temperature dependence to the barrier height inhomogeneities prevailing at the metal-semiconductor interface [19], [32]- [34]. The Schottky barrier height on SiC is, in general, determined by both the metal work function and the interface states [35].…”
Section: Resultsmentioning
confidence: 99%