Temperature effects on the structural, optical, electrical and morphological properties of the RF-sputtered Mo thin films

Akçay, N.; Akin, Nihan; Comert, Buse; Özçelik, Süleyman

doi:10.1007/s10854-016-5536-8

Cited by 11 publications

(6 citation statements)

References 25 publications

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“…It is noted that surface roughness values measured using atomic force microscopy on the Mo thin film sputtered over plain glass substrates were in the range of %2-10 nm. [18,22,51,54] However, in this work surface roughness determined by the optical profilometer for Mo thin film deposited on plain substrate was slightly higher. In TFSCs bottom electrode having high surface roughness is expected to improve diffuse reflectance that is more beneficial for the light absorption in the adjacent absorber layer.…”

Section: Sem and Optical Profilometer Analyses Of Bilayer Mo Thin Fil...contrasting

confidence: 58%

“…These textured glass substrates were used as substrates for the growth of Mo bilayer thin film at the optimized conditions of top layer 10 min bottom À1 layer 3 min. [18,21,46,51] The observed structural and electrical properties indicate that 10/3 min Mo bilayer thin films grown on plain and textured substrates are relatable and hence the use of textured substrates for the back electrode indicates prospects of gaining improved optical performance or more particularly the reflectance behavior.…”

Section: Optical Microscopy Imaging Of Su-8 Textured Substratesmentioning

confidence: 99%

“…parameters such as applied sputtering power, working pressure, target to substrate distance, and substrate temperature, allows to obtain Mo thin films with desired electrical, optical, and good adhesion properties. [18][19][20][21][22][23][24] In addition, postdeposition annealing treatment of Mo thin films is also shown to have pronounced effects on the microstructural and electrical properties due to the reduction in microstrain and dislocation density leading to lesser electron scattering. [25] Thin films deposited at low vacuum (above 1 Â 10 À2 mbar) tend to have strong adhesion to the glass substrate but show high resistivity, whereas thin films deposited at high vacuum (below 1 Â 10 À2 mbar) tend to have poor adhesion and low resistivity.…”

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confidence: 99%

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Enhanced Diffuse Reflectance of Photons in Molybdenum Back Electrode Films Achieved via Surface Texturing for Thin Film Solar Cells

Moosi Govindharajulu,

Rajendran,

Piraviperumal

2023

Physica Rapid Research Ltrs

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Molybdenum (Mo) thin film is widely used as the bottom electrode in substrate‐configured thin film solar cells due to its high conductivity and reflectivity. Mo grown onto microtextured substrates increases the diffuse reflection of incident photons via scattering/multiple reflections on the corner/edges, in addition to the contribution from increased surface area. Herein, bilayer Mo is grown using direct current magnetron sputtering onto plain and textured substrates. To texture the glass substrate surface, a periodic array of cross‐linked photoresist structures (SU‐8 2000.5 & SU‐8 2005) is introduced via UV‐lithography process. Characterizations are done using X‐ray diffractometer, optical microscope, scanning electron microscope, and optical profilometer. Angle‐dependent specular reflectance, diffuse reflectance, and electrical measurements done on Mo grown on plain and textured substrates lead to a comprehensive understanding of the advantages of growing Mo films on textured substrates. The electrical resistivity of Mo grown on plain and textured substrates is of the same order, measuring 3.09 × 10−5 Ω cm, 3.25 × 10−5 Ω cm, and 3.87 × 10−5 Ω cm, respectively. A high‐diffuse reflectance of 62.7% is obtained for SU‐8 2005 textured Mo films. Investigations using COMSOL simulations support the optical reflectance analysis.

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Section: Sem and Optical Profilometer Analyses Of Bilayer Mo Thin Fil...contrasting

confidence: 58%

Section: Optical Microscopy Imaging Of Su-8 Textured Substratesmentioning

confidence: 99%

mentioning

confidence: 99%

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Enhanced Diffuse Reflectance of Photons in Molybdenum Back Electrode Films Achieved via Surface Texturing for Thin Film Solar Cells

Moosi Govindharajulu,

Rajendran,

Piraviperumal

2023

Physica Rapid Research Ltrs

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“…Magnetron sputtering is the most commonly used method for the preparation of Mo films originating from several advantages such as low cost, easy to adjust the parameters, films can be deposited uniformly on large-sized areas [6]. A large number of studies have shown that the structures and properties of Mo films are related to the preparation process and parameters [7][8][9]. For instance, Akçay et al, [10] investigated the effects of deposition pressures and powers on the structures and photoelectric properties of Mo films prepared by radio frequency (RF) magnetron sputtering.…”

Section: Introductionmentioning

confidence: 99%

Effects of Bottom Layer Sputtering Pressures and Annealing Temperatures on the Microstructures, Electrical and Optical Properties of Mo Bilayer Films Deposited by RF/DC Magnetron Sputtering

2019

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Most of the molybdenum (Mo) bilayer films are deposited by direct current (DC) magnetron sputtering at the bottom and the top layer (DC/DC). However, the deposition of Mo bilayer film by radio frequency (RF) Mo bottom layer and DC Mo top layer magnetron sputtering has been less studied by researchers. In this paper, the bottom layer of Mo bilayer film was deposited by RF magnetron sputtering to maintain its good adhesion and high reflectance, and the top layer was deposited by DC magnetron sputtering to obtain good conductivity (RF/DC). Generally, the bottom layer sputtering pressure is relatively random, in this paper, the effects of the bottom layer RF sputtering pressures on the microstructures and properties of Mo bilayer films were first studied in detail. Next, in order to further improve their properties, the as-prepared Mo bilayer films at 0.4 Pa bottom layer RF sputtering pressure were annealed at different temperatures and then investigated. Specifically, Mo bilayer films were deposited on soda-lime glass substrates by RF/DC magnetron sputtering at different bottom layer RF sputtering pressures in the range of 0.4-1.2 Pa, the powers of bottom layer RF sputtering and top layer DC sputtering were 120 W and 100 W, respectively. Then, Mo bilayer films, prepared at a bottom layer sputtering pressure of 0.4 Pa and top layer sputtering pressure of 0.3 Pa, were annealed for 30 min at various temperatures in the range of 100-400 • C. The effects of bottom layer sputtering pressures and the annealing temperatures on the microstructures, electrical and optical properties of Mo bilayer films were clarified by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic-force microscopy (AFM), and ultraviolet (UV)-visible spectra, respectively. It is shown that with decreasing bottom layer sputtering pressure from 1.2 to 0.4 Pa and increasing annealing temperature from 100 to 400 • C, the crystallinity, electrical and optical properties of Mo bilayer films were improved correspondingly. The optimized Mo bilayer film was prepared at the top layer sputtering pressure of 0.3 Pa, the bottom layer sputtering pressure of 0.4 Pa and the annealing temperature of 400 • C. The extremely low resistivity of 0.92 × 10 −5 Ω.cm was obtained. The photo-conversion efficiency of copper indium gallium selenium (CIGS) solar cell with the optimized Mo bilayer film as electrode was up to as high as 13.5%.

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“…These make Mo a primary choice as a back-contact material, not only for the common CIGS material, but also for the industry standard for novel and selenium-free absorber layers, such as Cu 2 ZnSnS 4 (CZTS), CuSnS 3 (CTS) and SnS [6,7,8]. The properties and microstructures of Mo thin films could be controlled and adjusted to promote the functionality of solar cells in industry [9] and their morphology can be obviously changed from dense to porous, depending on the processing parameters, such as the sputtering pressure, sputtering power, substrate temperature, annealing temperature, substrate-target distance and type of discharge [10,11,12,13]. These in turn affect the residual stress, conductivity, optical reflectance and adhesion with soda-lime glass (SLG) [14].…”

Section: Introductionmentioning

confidence: 99%

Effects of Heating Mode and Temperature on the Microstructures, Electrical and Optical Properties of Molybdenum Thin Films

et al. 2018

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In this paper, molybdenum (Mo) thin films are deposited on soda-lime glass (SLG) substrates by direct current magnetron sputtering and heated in three different modes at different temperatures, including substrate heating, annealing treatment, and both substrate heating and annealing treatment. The effects of heating temperature and heating mode on the structures, morphology, optical and electrical properties of Mo thin films were systematically investigated by X-ray diffraction (XRD), Scanning electron microscopy (SEM), atomic force microscope (AFM) and UV-visible spectrophotometer (UV-vis spectra). It is shown that as the substrate and annealing temperature increase, the crystallinity of Mo thin films is improved, and the grain sizes become bigger. Especially in the mode of both substrate heating and annealing treatment at higher temperature, the obtained Mo thin films show higher crystallinity and conductivity. Moreover, with the increase of substrate and annealing temperature in different heating modes, both the surface compactness of Mo films and the optical reflectance increase correspondingly. Furthermore, the Mo film, prepared at the substrate heating temperature of 400 °C and annealed at 400 °C, showed excellent comprehensive performance, and the resistivity is as low as 1.36 × 10−5 Ω·cm. Using this optimized Mo thin film as an electrode, copper indium gallium selenium (CIGS) solar cells have a maximum photo-conversion efficiency of 12.8%.

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Temperature effects on the structural, optical, electrical and morphological properties of the RF-sputtered Mo thin films

Cited by 11 publications

References 25 publications

Enhanced Diffuse Reflectance of Photons in Molybdenum Back Electrode Films Achieved via Surface Texturing for Thin Film Solar Cells

Enhanced Diffuse Reflectance of Photons in Molybdenum Back Electrode Films Achieved via Surface Texturing for Thin Film Solar Cells

Effects of Bottom Layer Sputtering Pressures and Annealing Temperatures on the Microstructures, Electrical and Optical Properties of Mo Bilayer Films Deposited by RF/DC Magnetron Sputtering

Effects of Heating Mode and Temperature on the Microstructures, Electrical and Optical Properties of Molybdenum Thin Films

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