2010
DOI: 10.1007/s10765-010-0786-9
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Temperature Measurement of Semitransparent Silicon Wafers Based Upon Absorption Edge Wavelength Shift

Abstract: The temperature dependence of silicon wafer transmittance is well understood, and is caused by various absorption mechanisms over a wide spectral range. As the wavelength increases, the photon energy decreases until it becomes lower than the minimum energy gap in the silicon band structure. At this point, which is often referred to as the absorption edge wavelength, there is a rapid drop in absorption. The absorption edge shifts to a longer wavelength with increasing temperature, because the bandgap narrows wi… Show more

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Cited by 5 publications
(2 citation statements)
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“…It should be noted that silicon is no longer transparent in the near infrared at above roughly 800 • C [12].…”
Section: In Situ Measurement [11]mentioning
confidence: 99%
“…It should be noted that silicon is no longer transparent in the near infrared at above roughly 800 • C [12].…”
Section: In Situ Measurement [11]mentioning
confidence: 99%
“…Yet it is important, for instance, for vapor phase epitaxy or chemical vapor deposition using microfabricated silicon heaters. [1][2][3] Depending on measurement circumstances, temperature can be measured using a thermocouple drilled directly into a silicon sample, 4,5 infrared spectroscopy, 6,7 Raman spectroscopy, 8 or a thermistor. 2 In this paper, we present an alternative approach, where we explore two methods for obtaining the temperature of silicon from a single set of voltage measurements.…”
Section: Introductionmentioning
confidence: 99%