Temperature measurements of glass substrates during plasma etching

Bond, Robert; Dzioba, Steven; Naguib, Hala F.

doi:10.1116/1.570753

Cited by 44 publications

(10 citation statements)

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“…The phase difference δ varies even when l changes as a result of thermal expansion [2,3]. However, the coefficient of thermal expansion α for the LiNbO 3 crystal is α = 2.0 × 10 -6 K -1…”

Section: Principle Of Temperature Measurement [1]mentioning

confidence: 96%

Heat flux into the substrate and electric power measurement in radio frequency discharge plasma

Hachiya

Ebe

Kato

et al. 2006

Electrical Engineering Japan

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SUMMARYWe performed measurements of the radio frequency power and temperature of electrodes and plasma parameters of rf discharge. The purpose of this research is to check the accuracy of the measurement of energy consumed in plasmas. The heat energy in plasma was obtained by heat flux that was calculated from substrate temperature. The temperature was measured by a laser interferometer using LiNbO 3 crystals. In the case of electrode spacings of 2, 3, and 4 cm, the heat energy toward electrodes was 7.7, 5.4, and 4.0 W, respectively. The current and voltage measurement was made at the driven electrode. The input power was 8.2, 5.1, and 7.7 W for electrode spacings of 2, 3, and 4 cm, respectively. The heat energy calculation based on the electron density distribution measured was conducted by estimating the Bohm flux and ambipolar diffusion flux. It was found that the heat energy toward electrodes was 1.4, 1.8, and 1.5 W for electrode spacings of 2, 3, and 4 cm, respectively, and the heat toward the wall was negligible.

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Section: Principle Of Temperature Measurement [1]mentioning

confidence: 96%

Heat flux into the substrate and electric power measurement in radio frequency discharge plasma

Hachiya

Ebe

Kato

et al. 2006

Electrical Engineering Japan

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“…The ion power density measurements (±la-lO%) were made using the in situ substrate temperature measurement technique [i], in which the temperature of plate-glass substrates were monitored via laser interferometry [6,7].…”

Section: Methodsmentioning

confidence: 99%

The Role of Heat Transfer during Reactive-Ion Etching of Polymer Films

Dems¹,

Rodriguez²

1990

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“…Bond and co-workers performed temperature measurements on a glass substrate by means of the interference fringes created between light reflected from the upper and lower surfaces of the substrate during thermal expansion [6]. This method has been used to measure the temperature of PMMA substrates [7].…”

Section: Introductionmentioning

confidence: 99%