Template replication for full wafer imprint lithography

Miller, Mike; Schmid, Gerard M.; Doyle, Gary; Thompson, Ecron; Resnick, Douglas J.

doi:10.1016/j.mee.2007.01.060

Cited by 10 publications

(6 citation statements)

References 7 publications

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“…Previous processes have shown how to make templates of different tones. 2,15 If one imprints from a hole tone template, then the imprint resist image consists of isolated polymer pillars which can have issues related to resist material. 16 The geometry of the template also restricts the flow of the liquid imprint resist from one cavity to the adjacent cavity (prior to UV cure).…”

Section: Imprinting Patterns Bpmmentioning

confidence: 99%

“…Many of these important parameters have been discussed in the literature. [1][2][3][4] However, there are also other features that must be incorporated into a master template related to the architecture of a disk drive. Namely, data should have high bit aspect ratio (BAR >1) to relax the requirements for track misregistration (TMR) and magnetic sensor read width (MRW).…”

Section: Introduction Bpm Template Requirementsmentioning

confidence: 99%

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Imprint lithography template technology for bit patterned media (BPM)

et al. 2011

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Bit patterned media (BPM) for magnetic recording has emerged as a promising technology to deliver thermally stable magnetic storage at densities beyond 1Tb/in 2 . Insertion of BPM into hard disk drives will require the introduction of nanoimprint lithography and other nanofabrication processes for the first time. In this work, we focus on nanoimprint and nanofabrication challenges that are being overcome in order to produce patterned media.Patterned media has created the need for new tools and processes, such as an advanced rotary e-beam lithography tool and block copolymer integration. The integration of block copolymer is through the use of a chemical contrast pattern on the substrate which guides the alignment of di-block copolymers.Most of the work on directed self assembly for patterned media applications has, until recently, concentrated on the formation of circular dot patterns in a hexagonal close packed lattice. However, interactions between the read head and media favor a bit aspect ratio (BAR) greater than one. This design constraint has motivated new approaches for using self-assembly to create suitable high-BAR master patterns and has implications for template fabrication.

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Section: Imprinting Patterns Bpmmentioning

confidence: 99%

Section: Introduction Bpm Template Requirementsmentioning

confidence: 99%

Imprint lithography template technology for bit patterned media (BPM)

et al. 2011

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“…Several replication schemes are being considered, including single-step replication (master template to working template) and two-step replication (master template to "sub-master" template to working template). 14 The replication of templates can be accomplished using the same imprinting process as described in Section 3a. After imprinting, a plasma-based etch process is employed to transfer the relief pattern into the fused silica.…”

Section: B Template Replication Using Step and Flash Imprint Lithogrmentioning

confidence: 99%

Step and flash imprint lithography for manufacturing patterned media

Brooks¹,

Schmid²,

Miller³

et al. 2009

Alternative Lithographic Technologies

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The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 10 12 bits per square inch.Step and Flash Imprint Lithography (S-FIL) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable S-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, and dual-sided imprinting. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dualsided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

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“…This technique has recently been demonstrated for photonic crystal arrays. 4 The methodology is reviewed below.…”

Section: Template Replicationmentioning

confidence: 99%