Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films

G., A. Tavakkoli K.; Gotrik, Kevin W.; Hannon, Adam F.; Alexander‐Katz, Alfredo; Ross, Caroline A.; Berggren, Karl K.

doi:10.1126/science.1218437

Cited by 255 publications

(255 citation statements)

References 37 publications

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“…Furthermore, as shown in Fig. 4g,h, self-consistent field theory (SCFT) simulations [29][30][31][32][33] were used to calculate the block copolymer morphology resulting from the input templates of Fig. 4a,b.…”

Section: Resultsmentioning

confidence: 99%

Design rules for self-assembled block copolymer patterns using tiled templates

et al. 2014

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Directed self-assembly of block copolymers has been used for fabricating various nanoscale patterns, ranging from periodic lines to simple bends. However, assemblies of dense bends, junctions and line segments in a single pattern have not been achieved by using sparse templates, because no systematic template design methods for achieving such complex patterns existed. To direct a complex pattern by using a sparse template, the template needs to encode the key information contained in the final pattern, without being a simple copy of the pattern. Here we develop a set of topographic template tiles consisting of square lattices of posts with a restricted range of geometric features. The block copolymer patterns resulting from all tile arrangements are determined. By combining tiles in different ways, it is possible to predict a relatively simple template that will direct the formation of non-trivial block copolymer patterns, providing a new template design method for a complex block copolymer pattern.

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Section: Resultsmentioning

confidence: 99%

Design rules for self-assembled block copolymer patterns using tiled templates

et al. 2014

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“…This approach, which relies on a crystal surface reconstruction, yet another self-assembly process, does not require large area 'top-down' lithography and shows promise as a low-cost approach for roll-to-roll-type processes. Ross and co-workers [81,[150][151][152][153] investigated PS-b-PFS and PS-b-PDMS BCPs with topography confinement. They used e-beam lithography to pattern HSQ pillars with the desired spacing and shape.…”

Section: Control Of Orientation and Lateral Ordering In Block Copolymersmentioning

confidence: 99%

Pattern transfer using block copolymers

Gunkel

Russell

2013

Phil. Trans. R. Soc. A.

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To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore's law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.

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“…These segments self-assemble by phase-separating into small domains with geometries that can be tuned based on a number of factors, including the length and composition of the polymer. The resulting structures can be utilized as templates for high-density information storage, 9 nanoelectronics, 10 photonic crystals, 11 and complex 3D structures ( Figure 2 a-c ) 12 that are diffi cult to make using conventional lithography. Surface instabilities such as wrinkling, offer another approach to achieve patterning by self-organization.…”

Section: Examples and Applicationsmentioning

confidence: 99%