Proceedings of the 10th International Symposium on Power Semiconductor Devices and ICs. ISPSD'98 (IEEE Cat. No.98CH36212)
DOI: 10.1109/ispsd.1998.702638
|View full text |Cite
|
Sign up to set email alerts
|

The 4500 V-750 A planar gate press pack IEGT

Abstract: This paper presents the 45OOV-75OA planar gate IEGT (P-IEGT), which has wide cell width. Increasing gate width, the planar devices achieves the carrier injection enhancement effect. Wide gate structure shows better characteristics for high voltage planar devices than the conventional IGBT. The on-state vloltage drop is 3.8V a t 50Ncm2 ,Tj=25"C. The value is low enough for 4500V rated MOS gate transistor. We achieve turn off capability at Vce(peak)=4000V, Ic=1600A without adding dvjdt snubber a t T~=125 "C . Th… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
7
0

Publication Types

Select...
5
3

Relationship

0
8

Authors

Journals

citations
Cited by 19 publications
(7 citation statements)
references
References 4 publications
0
7
0
Order By: Relevance
“…CIRCUIT PARAMETERS AND OPERATING CONDITIONS [11], [12], [13], [15], [18] The press-pack type 4.5kV IEGTs have been placed on the market, mainly for the use in medium voltage converters [16], [17]. In this paper, a 4.5kV/2100A press-pack IEGT (Toshiba ST2100GXH22A) is considered for the loss analysis [18].…”
Section: Table Imentioning
confidence: 99%
“…CIRCUIT PARAMETERS AND OPERATING CONDITIONS [11], [12], [13], [15], [18] The press-pack type 4.5kV IEGTs have been placed on the market, mainly for the use in medium voltage converters [16], [17]. In this paper, a 4.5kV/2100A press-pack IEGT (Toshiba ST2100GXH22A) is considered for the loss analysis [18].…”
Section: Table Imentioning
confidence: 99%
“…Note that as u varies between 0 and 1 the basis functions are normalized to vary over the same range. The dynamics of the plasma are approximated by application of the well known Rayleigh-Ritz method to Equation (1). Firstly the plasma distribution between x ¼ x l and x ¼ x r (see Figure 1(b)) is approximated by p ¼ N ðuÞcðtÞ; where cðtÞ is a column vector of parameters to be numerically computed as a function of time t; but which are independent of position.…”
Section: Solution Of the Ambipolar Diffusion Equationmentioning
confidence: 99%
“…Gate turn-off thyristors (GTOs) and conventional insulated gate bipolar transistors (IGBTs) are currently popular choices, however both devices have serious drawbacks: GTO thyristors require large gate currents to control them; whereas IGBTs suffer from a relatively high voltage drop and power dissipation in applications over 2 kV due to their lower conductivity modulation. The injection enhanced gate transistor (IEGT) [1,2] has been recently presented by TOSHIBA as a high voltage power device for the future as it combines the best properties of the GTO and IGBT devices: the device is easy to control as MOS device and it has thyristor/PiN diode like carrier distribution inside the n-base region when switched on (this reduces R DS;on of the device and on-state voltage drop).…”
Section: Introductionmentioning
confidence: 99%
“…Injection-enhanced gate transistors (IEGTs) [1] are extensively used for high-voltage and -current applications that combine the best properties of gate turn-off thyristors (GTO) and insulated gate bipolar transistors (IGBT) devices. The surface accumulation layer beneath the gate of depletion-mode devices, such as vertical double-diffused MOS (VDMOS), spreads the majority carrier current from the thin surface layer into the bulk region of the device.…”
Section: Introductionmentioning
confidence: 99%