The Alignment Method for Linear Scale Projection Lithography Based on CCD Image Analysis

Ren, Dongxu; Xi, Jianpu; Li, Zhengfeng; Li, Bin; Zhao, Zexiang; Zhao, Huiying; Cui, Lujun; Xu, Hang

doi:10.3390/ecsa-4-04936

Cited by 3 publications

(3 citation statements)

References 11 publications

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“…On the one hand, non-optical displacement measurement methods include capacitance measurement and inductance measurement [13,14]. On the other hand, laser triangulation [15], optical levers [16], grating displacement measurement [17], fiber displacement measurement [18], and laser interferometry [19] belong to the optical displacement measurement methods. The capacitance measurement method can achieve high measurement resolution, but its range is shorter, generally less than 1 mm [20].…”

Section: Introductionmentioning

confidence: 99%

Displacement Measurement Method Based on the Rotating Paraboloid Array

Zhang

et al. 2019

Applied Sciences

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Using an optical freeform surface to realize the precision measurement of displacement has become a research focus in the present day. However, the measurement range of this method is limited by the size of the freeform surface processed. In order to overcome this difficulty, this paper presents a two-dimensional displacement measurement system with a large range, which is composed of a slope sensor and a rotating paraboloid array. The slope sensor utilizes the optical structure of an autocollimator with minor optimization, and the rotating paraboloid array expands the measurement range of the system in a discrete manner. The experimental results showed that the optimized optical system enhanced the measurement accuracy to ±0.4 μm within the range of 1500 μm and the overall measurement error was approximately ±2 μm when measured within the range of 450 mm. The developed measurement system has potential applicability for detection of errors, such as the position error and straightness error of multi-axis systems.

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Section: Introductionmentioning

confidence: 99%

Displacement Measurement Method Based on the Rotating Paraboloid Array

Zhang

et al. 2019

Applied Sciences

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“…The pulsed xenon lamp power control system is the main factor affecting the energy release time [1][2][3]. In raster computing lithography, the static exposure of the lithographic threshold model is used to calculate the accuracy of the exposure energy on the grating fringe [4][5], such as the dynamic exposure energy lithography of the diffraction grating [6]. In this paper, the volt-ampere characteristics of pulsed xenon lamp are studied for the pulsed xenon lamp power supply circuit.…”

Section: Introductionmentioning

confidence: 99%

Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating

Ren

Zhao

et al. 2019

2019 25th International Conference on Automation and Computing (ICAC)

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In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of highprecision grating scale calculation.

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“…The alignment of grating lithography is characterized by uniform grating stripes and a certain length; therefore, a major technical problem arises when a lithography plate or mask exhibits a tilting or rotating phenomenon. Such an installation error will seriously affect the accuracy of the linear scale, and some related content has been explained at an international conference [ 1 ].…”

Section: Introductionmentioning

confidence: 99%

Alignment Method for Linear-Scale Projection Lithography Based on CCD Image Analysis

Ren

Zhao

et al. 2018

Sensors

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This paper presents a method to improve the alignment accuracy of a mask in linear scale projection lithography, in which the adjacent pixel gray square variance method is applied to a charge-coupled device (CCD) image to obtain the best position of the focal length of the motherboard and then realize the alignment of the focal plane. Two image positions in the focal plane of the CCD are compared with the traits overlap according to the image splicing principle, and four typical errors are corrected on the basis of the total grating errors. Simultaneously, the rotation error of the mask is used to summarize the grayscale variation function of the CCD image. Threshold functions are employed to express the factors including the wave crests of the amplitude, period error, and phase error, which govern the rotation accuracy and weight alignment accuracy expression of the established four error factors. Finally, in the experiment, the slope of the mask is corrected and adjusted to the same direction as the slide plate with the assistance of a dual-frequency laser interferometer. The effect of the alignment error on the lithography accuracy is discussed and verified in the static case, and it is found that the CCD maximum resolution pixel is 0.1 μm and accuracy of the scale is 0.79 μm in only a 200-mm-measurement range.

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The Alignment Method for Linear Scale Projection Lithography Based on CCD Image Analysis

Cited by 3 publications

References 11 publications

Displacement Measurement Method Based on the Rotating Paraboloid Array

Displacement Measurement Method Based on the Rotating Paraboloid Array

Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating

Alignment Method for Linear-Scale Projection Lithography Based on CCD Image Analysis

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