The anodic vacuum arc. II. Experimental study of arc plasma

Ehrich, H.; Hasse, B.; Müller, K.; Schmidt, R.

doi:10.1116/1.575535

Cited by 46 publications

(18 citation statements)

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“…Deposition rate up to 40 nm/s is achievable with input power in the range of 400-900 W that is much higher than those obtainable by using other physical vapor deposition (PVD) processes. For example, in sputter deposition even with much higher power inputs the sputter rates are quite low [10]. The high deposition rate (5-40 nm/s) of AVA coupled with macroparticle free stream of highly ionized energetic particles makes it industrially viable.…”

Section: Introductionmentioning

confidence: 98%

Reliability of anodic vacuum arc in depositing thermoelectric alloy thin films

Mukherjee

Barhai

2012

Journal of Alloys and Compounds

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Section: Introductionmentioning

confidence: 98%

Reliability of anodic vacuum arc in depositing thermoelectric alloy thin films

Mukherjee

Barhai

2012

Journal of Alloys and Compounds

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“…To reduce or eliminate the droplets, various MP filters were developed [1] using magnetic filtered cathodic vacuum arc plasma [3], anode evaporation in hot anodic vacuum arcs [4], and more recently the hot refractory anode vacuum arc (HRAVA) discharge mode [5].…”

Section: Introductionmentioning

confidence: 99%

Vacuum arc deposition using refractory electrodes

Beilis

Koulik

Yankelevich

et al. 2014

2014 International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)

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Refractory metal plasma generated by a vacuum arc was used to deposit thin films. The deposition rate V dep was measured for different electrode configurations: (1) a planar Zr cathode and a planar W anode-both 60mm diam, (2) 32 mm diam cylindrical W or Mo electrode pairs, and a (3) Nb cylindrical cathode (32 mm diam) closed by a BN plate and a 50 mm diam W shower-head cup anode with either (a) an array of 1 mm diameter exit holes or (b) one 4 mm diam hole Ta cup anode. For Zr films, V dep was 0.8 m/min at a distance 110 mm from the electrode axis at 90 s after arc ignition. For W films at 60 s after ignition and the planar electrode configuration, V dep was 0.6 m/min at a distance of 60 mm from the electrode axis. For Nb films deposited with the closed electrode configuration, V dep was 0.3 m/min at distance 80 mm from the front shower anode surface at 30 s after arc ignition. For cylindrical Mo electrode pair V dep was about 0.4 m/min at a distance of 110 mm, 70 s after 200 A arc ignition.

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“…These particles degrade the films that should be clean for optics and electronics applications. To reduce or eliminate the droplets, various MP filters were developed [1] using magnetic filtered cathodic vacuum arc plasma [3], anode evaporation in hot anodic vacuum arcs [4], and more recently, the hot refractory anode vacuum arc (HRAVA) discharge mode [5].…”

Section: Introductionmentioning

confidence: 99%

Thin-Film Deposition With Refractory Materials Using a Vacuum Arc

Beilis

Koulik

Yankelevich

et al. 2015

IEEE Trans. Plasma Sci.

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Refractory metal plasma generated by a vacuum arc was used to deposit thin films with different arc currents I. The deposition rate V dep was measured for electrode configurations including a planar Zr cathode and a planar W anode; cylindrical W or Mo electrode pairs and a cylindrical Nb cathode closed by a BN plate and a W or Nb shower-head cup anode or with one-hole Ta cup anode. V dep for a Mo electrode pair with I = 275 A at a distance L = 110 mm from the electrode axis reached 2.2 µm/min, 60 s after arc ignition. For the W electrode pair V dep was ∼1 µm/min at 80 s (I = 200 A and L = 110 mm), while for W film deposition with shower-head anode V dep was ∼0.6 µm/min (I = 200 A and L = 60 mm). For Nb films deposited with the closed electrode configuration, V dep was 0.3 µm/min at 30 s after arc ignition (I = 275 A and L = 80 mm from the anode front).Index Terms-Metallic plasma, refractory electrode, thin film, vacuum arc.

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The anodic vacuum arc. II. Experimental study of arc plasma

Cited by 46 publications

References 0 publications

Reliability of anodic vacuum arc in depositing thermoelectric alloy thin films

Reliability of anodic vacuum arc in depositing thermoelectric alloy thin films

Vacuum arc deposition using refractory electrodes

Thin-Film Deposition With Refractory Materials Using a Vacuum Arc

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