1992 Proceedings 42nd Electronic Components &Amp; Technology Conference
DOI: 10.1109/ectc.1992.204338
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The application of laser process technology to thin film packaging

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Cited by 11 publications
(3 citation statements)
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“…An RF induced plasma is used to increase the etch rate of the debris. Defects due to residue are dramatically lower in this process compared to the RIE process [23].…”
Section: Laser Ablationmentioning
confidence: 99%
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“…An RF induced plasma is used to increase the etch rate of the debris. Defects due to residue are dramatically lower in this process compared to the RIE process [23].…”
Section: Laser Ablationmentioning
confidence: 99%
“…The process has very few critical parameters which can be very well controlled: 1) laser fluence, 2) number of pulses, and 3) focus. The wall profiles are very uniform and can be controlled from 30" to 65" by changing the focus conditions [23]. The process is not aspect ratio limited for packaging applications and almost any polymer dielectric can be used.…”
Section: Laser Ablationmentioning
confidence: 99%
“…Among these technologies is Laser Chemical Vapor Deposition (LCVD) that is used to make discrete thin film interconnections on thin films lines [9]. To test the reliability of the deposited metal on thin film lines a number of repairs were subjected to various stress conditions such as electromigration, thermal cycling, and vibration.…”
Section: Latent Opens Testingmentioning
confidence: 99%