“…In spite of the many different surface techniques which have been used to study thin Au films on Si at RT, due to the difficulty of obtaining a direct correlation between electronic and morphological properties of the system there is little agreement over the exact nature of the interface. A nonexhaustive list of the techniques used, individually or combined, includes low-energy electron diffraction ͑LEED͒, [1][2][3][4][5][6][7][8][9] Auger electron spectroscopy ͑AES͒, [2][3][4][6][7][8][10][11][12][13] MeV ion backscattering, [14][15][16][17] electron-energy-loss spectroscopy ͑EELS͒, 4,6,[8][9][10][11][12][13][14][15][16][17][18][19][20] x-ray photoelectron spectroscopy ͑XPS͒, 21 ultraviolet photoelectron spectroscopy ͑UPS͒, 20,[22][23][24][25] photoemission yield spectroscopy, 7 soft-x-ray photoelectron spectroscopy,…”